プラズマ化学気相成長による選択チタンシリサイド膜堆積とシリサイド張り付けシリコン電極形成プロセス〔英文〕
スポンサーリンク
概要
著者
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito K
Department Of Materials Technology Chiba University
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有田 睦信
NTT LSI 研究所
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ARITA Yoshinobu
NTT LSI Laboratories
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Sato K
Department Of Electronics And Information Science Teikyo University Of Science And Technology
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SAITO Kunio
NTT LSI Laboratories
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AMAZAWA Takao
NTT LSI Laboratories
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Saito K
Nagaoka National Coll. Technol. Nagaoka Jpn
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天沢 敬生
Ntt Lsi研究所
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Saito K
Application Laboratory
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Saito K
Av-it Development Group. Sony Corporation
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Arita Y
Ntt System Electronics Lab. Kanagawa Jpn
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斎藤 国夫
NTT LSI Laboratories
関連論文
- Achievement of 10 keV Central Electron Temperatures by ECH in LHD
- Prevention of Reversed Flow in Gas Divertor with High Vacuum Chamber
- Optical Properties of Er-Doped CuAlS_2
- Effect of Fermi Level Motion on the Optical, ESR and Transport Properties of CuInSe_2
- Photoluminescence Studies of Wurtzite Type W-ZnAl_2S_4 Single Crystals
- ESR and Optical Studies of CuInS_2 Single Crystals
- Green Photoluminescence from α-Phase ZnAl_2S_4
- ESR Characterization of CuAlSe_2 Single Crystals
- Photoluminescence Spectra of Tm-Doped CuAlS_2 Crystals
- Single Crystals of cuAlS_2 Doped with Rare-Earth Ions
- Optical and ESR Characterization of Transition Atoms in CuAlS_2
- Visible Photoluminescence in Undoped and Zn-doped CuAlS_2
- Photoluminescence Studies in CuAlS_2:Zn
- Optical Absorption and Electron Spin Resonarnce in CuAlS_2:Ni
- Optical Absorption of Co^ in CuAlS_2
- シート・プラズマ中のヘリウムイオン温度
- Improvement in Performances of ZnO : B/i-ZnO/Cu(InGa)Se_2 Solar Cells by Surface Treatments for Cu(InGa)Se_2
- Magnetooptical Spectra in PtMnSb between 1.2 and 5.9 eV
- Impact of 90ﾟ-Domain Wall Motion in Pb(Zr_Ti_)O_3 Film on the Ferroelectricity Induced by an Applied Electric Field
- Thick Epitaxial Pb(Zr_,Ti_)O_3 Films Grown on (100)CaF_2 Substrates with Polar-Axis-Orientation
- Cu 配線技術 - 化学気相成長および反応性イオンエッチング技術 -
- Electrically Induced Optical Absorption in Al-CuAlS_2-Au Diode
- Near-Infrared Photoluminescence in Mo-Doped Single Crystals of CuAlS_2
- Photoconductive Image Using CuInSe_2 Film
- Characterization by Photoluminescence of ICB-Grown CuInSe_2 Thin Films
- Submicron-Size Fabrication of Bi_2Sr_2CaCu_2O_x Thin Films by Utilizing Facet Growth
- Anisotropic Transport Properties in Twin-Free Bi_2Sr_2CaCu_2O_x Thin Films on Tilted LaAlO_3 (001) Substrates
- Raman Scattering Studies of CuInS_2 Films Grown by RF Ion Plating
- Low-Temperature Deposition of CuIn(S_xSe_)_2 Thin Films by Ionized Cluster Beam Technique
- Growth and Characterization of CuInS_2 Films grown by Rf Ion-Plating
- GaAs Pseudo-Heterojunction Bipolar Transistor with a Heavily Carbon-Doped Base
- Theoretical Analysis of Heavy Doping Effects on AlGaAs/GaAs HBT's
- TiN Thin Film Prepared by Chermical Vapor Deposition Method Using Cp_2Ti(N_3)_2
- Epitaxial Growth of GaSe Films by Molecular Beam Epitaxy on GaAs(111), (001) and (112) Substrates
- Photoinduced Oxidation of Epitaxial Ga_2Se_3 Grown by Molecular Beam Epitaxy
- Effect of Heavy Doping on Band Gap and Minority Carrier Transport of AlGaAs/GaAs HBT's (SOLID STATE DEVICES AND MATERIALS 1)
- 水素パッシベーション法によるW-選択CVD技術と浅接合コンタクト形成への応用
- 水素パッシベーションを用いたp+Si高濃度表面清浄化技術とそのコンタクト形成への応用
- Molecular Orientation of Liquid Crystalline Polymer Films Fabricated by Polarized-Laser Chemical Vapor Deposition
- Anisotropic Molecular Orientation of Poly(o-trimethylsilyl)-Phenylacetylene Film Swollen under High Magnetic Field
- Si-LSIにおけるCu配線
- Challenge of Near-Field Recording beyond 50.4 Gbit/in^2
- Near-Field Optical Recording on a Pre-Grooved Phase-Change Disk in the Blue-Violet
- Near-Field Phase-Change Optical Recording of 1.36 Numerical Aperture
- Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir-Blodgett Films : Surfaces, Interfaces, and Films
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Electron and Hole Proximity Effects in the InAs/AlSb/GaSb System
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography : I.Limited Permeation of Si Compounds from Vapor Phase
- Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching with Aliphatic, Aromatic and Alicyclic Homopolymers, Polymer Blends and Copolymers
- Energy Quenching Effects on Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or a-Methyl Styrene with Methyl Methacrylate
- Large Electric Conductance in the Interface Direction of Polar/Nonpolar Double-Layered Hetero-Langmuir-Blodgett Films
- Optically Detected Cyclotron Resonance by Multichannel Spectroscopy
- Surface Plasmon-Enhanced Photocurrent in Organic Photoelectric Cells
- Photodegradable Toners for Electrophotography I. Photodegradability of Matrix Resin
- Enhanced Photocurrent in Organic Photoelectric Cells Based on Surface Plasmon Excitations
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- プラズマ化学気相成長による選択チタンシリサイド膜堆積とシリサイド張り付けシリコン電極形成プロセス〔英文〕
- Analog Computation Using Quantum-Dot Cell Network
- Analog Computation Using a Quantum-Dot Cell Network
- Emission Spectra from Pulsed Discharges in Liquid Helium
- Time-Resolved Spectroscopic Measurerments of Plasmas after Pulsed Discharges in Liquid Helium
- Power Durability of Al-W Alloy Electrodes Used in RF-Band Surface Acoustic Wave Filters
- Effect of Spacer Layer Thickness on Energy Level Width Narrowing in GaInAs/InP Resonant Tunneling Diodes Grown by Organo-Metallic Vapor Phase Epitaxy
- Transport Anisotropy of Si Delta-Doped Layer in InP Grown by OMVPE
- The Power Durability of 900 MHz Band Double-Mode-Type Surface Acoustic Wave Filters and Improvement in Power Durability of Al-Cu Thin Film Electrodes by Cu Atom Segregation
- Mechanism for Desorption of SiF_4 from an SiO_2 Film Surface in HF Solutions
- Mechanism for Desorption of SiF_4 from SiO_2 Film Surface in HF Solutions
- Deep Trap Measurement in Hg_Cd_xTe by Isothermal Capacitance and Deep-Level Transient Spectroscopy
- Improvement of Signal-to-Noise Ratio in Microphone Photoacoustic Spectroscopy
- Epitaxial Growth of CdTe by H_2 Sputtering : Semiconductors and Semiconductor Devices
- Deposition of Hydrogenated Microcrystalline Films of CdTe by Chemical Sputtering in Hydrogen : Surfaces, Interfaces and Films
- O_2 Plasma Etch Rate Reduction on Synchrotron Radiation Exposed PMMA Film
- Radical Generation Mechanism and Radical Effect on Aluminum Anisotropic Etching in SiCl_4 Reactive Ion Etching
- High-T_c(Bi, Pb)_2Sr_2Ca_2Cu_3O_ Superconducting Magnet Operated Using 20 K Gifford-McMahon-Type Refrigerator
- Structural Changes and Annealing Behavior of Ar-Ion-Irradiated Superconducting BiSrCaCu0 Thin Films
- Effect of Silicon Surface Cleaning on the Initial Stage of Selective Titanium Silicide Chemical Vapor Deposition
- Flower-Inducing Activity of Lysine in Lemna paucicostata 6746
- 0.25μmULSI多層配線のための選択CVD-Alビアプラグ平坦化技術
- Al選択成長 (サブミクロン時代の平坦化技術(技術ノ-ト))
- Work Function of a High-T_c Superconductor, YBa_2Cu_3O_7
- Accelerated-Deposition Rate and High-Quality Film Copper Chemical Vapor Deposition Using a Water Vapor Addition to a Hydrogen and Cu(HFA)_2 Reaction System
- Selective Deposition of Silicon Oxide Using a Plasma-Fluorinated Resist Mask : Surfaces, Interfaces and Films
- Plasma-Enhanced Chemical Vapor Deposition of Copper
- Al-Cu Alloy Etching Using In-Reactor Aluminum Chloride Formation in Static Magnetron Triode Reactive Ion Etching
- Effect of Gas Species on the Depth Reduction in Silicon Deep-Submicron Trench Reactive Ion Etching
- Reactive Ion Etching of Copper Films in SiCl_4 and N_2 Mixture
- Novel Static Magnetron Triode Reactive Ion Etching