TiN Thin Film Prepared by Chermical Vapor Deposition Method Using Cp_2Ti(N_3)_2

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-06-30

著者

• Maeda M

  Japan Sci. And Technol. Corp.(jst) Saitama Jpn

• Ikeda K

  Mitsubishi Electric Corp. Hyogo Jpn

• Ikeda Keisuke

  Institute For Materials Research Tohoku University

• Ikeda Keiji

  Department Of Physical Electronics Tokyo Institute Of Technology

• IKEDA Koichi

  NTT LSI Laboratories

• MAEDA Masahiko

  NTT LSI Laboratories

• ARITA Yoshinobu

  NTT LSI Laboratories

関連論文

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