Behavior of Alkoxy-Functional Groups on Atmospheric-Pressure Chemical Vapor Deposition Using Alkoxysilane and Ozone
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概要
- 論文の詳細を見る
- 1996-02-01
著者
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IKEDA Koichi
NTT LSI Laboratories
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MAEDA Masahiko
NTT LSI Laboratories
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池田 浩一
NTT LSI研究所
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Maeda M
Musashi Inst. Technol. Tokyo Jpn
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