The Behavior of Alkoxy-Functional Groups on Atmospheric-Pressure Chemical Vapor Deposition Using Alkoxysilane and Ozone

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• IKEDA Koichi

  NTT LSI Laboratories

• MAEDA Masahiko

  NTT LSI Laboratories

• 池田 浩一

  NTT LSI研究所

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• The Behavior of Alkoxy-Functional Groups on Atmospheric-Pressure Chemical Vapor Deposition Using Alkoxysilane and Ozone
• Characteristics of Silicon Dioxide Film Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethoxysilane and Ozone with Alcohol Addition
• Study of HF-Treated Heavily-Doped Si Surface Using Contact Angle Measurements
• Effect of Added Ethanol in Atmospheric-Pressure Chemical Vapor Deposition Reaction Using Tetraethoxysilane and Ozone
• Behavior of Alkoxy-Functional Groups on Atmospheric-Pressure Chemical Vapor Deposition Using Alkoxysilane and Ozone

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