Effect of Silicon Surface Cleaning on the Initial Stage of Selective Titanium Silicide Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-01-20
著者
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito K
Department Of Materials Technology Chiba University
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ARITA Yoshinobu
NTT LSI Laboratories
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Sato K
Department Of Electronics And Information Science Teikyo University Of Science And Technology
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SAITO Kunio
NTT LSI Laboratories
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AMAZAWA Takao
NTT LSI Laboratories
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Saito K
Nagaoka National Coll. Technol. Nagaoka Jpn
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Saito K
Application Laboratory
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Saito K
Av-it Development Group. Sony Corporation
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Arita Y
Ntt System Electronics Lab. Kanagawa Jpn
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