O_2 Plasma Etch Rate Reduction on Synchrotron Radiation Exposed PMMA Film
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-09-20
著者
-
Saito K
Department Of Materials Technology Chiba University
-
Yoshikawa Akira
Ntt Electrical Communications Laboratories
-
SAITO Kunio
NTT Electrical Communications Laboratories
関連論文
- Improvement in Performances of ZnO : B/i-ZnO/Cu(InGa)Se_2 Solar Cells by Surface Treatments for Cu(InGa)Se_2
- GaAs Pseudo-Heterojunction Bipolar Transistor with a Heavily Carbon-Doped Base
- Theoretical Analysis of Heavy Doping Effects on AlGaAs/GaAs HBT's
- Effect of Heavy Doping on Band Gap and Minority Carrier Transport of AlGaAs/GaAs HBT's (SOLID STATE DEVICES AND MATERIALS 1)
- Molecular Orientation of Liquid Crystalline Polymer Films Fabricated by Polarized-Laser Chemical Vapor Deposition
- Anisotropic Molecular Orientation of Poly(o-trimethylsilyl)-Phenylacetylene Film Swollen under High Magnetic Field
- Challenge of Near-Field Recording beyond 50.4 Gbit/in^2
- Near-Field Optical Recording on a Pre-Grooved Phase-Change Disk in the Blue-Violet
- Near-Field Phase-Change Optical Recording of 1.36 Numerical Aperture
- Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir-Blodgett Films : Surfaces, Interfaces, and Films
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Electron and Hole Proximity Effects in the InAs/AlSb/GaSb System
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography : I.Limited Permeation of Si Compounds from Vapor Phase
- Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching with Aliphatic, Aromatic and Alicyclic Homopolymers, Polymer Blends and Copolymers
- Energy Quenching Effects on Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or a-Methyl Styrene with Methyl Methacrylate
- Large Electric Conductance in the Interface Direction of Polar/Nonpolar Double-Layered Hetero-Langmuir-Blodgett Films
- Optically Detected Cyclotron Resonance by Multichannel Spectroscopy
- Surface Plasmon-Enhanced Photocurrent in Organic Photoelectric Cells
- Photodegradable Toners for Electrophotography I. Photodegradability of Matrix Resin
- Enhanced Photocurrent in Organic Photoelectric Cells Based on Surface Plasmon Excitations
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- プラズマ化学気相成長による選択チタンシリサイド膜堆積とシリサイド張り付けシリコン電極形成プロセス〔英文〕
- Epitaxial Growth of CdTe by H_2 Sputtering : Semiconductors and Semiconductor Devices
- Deposition of Hydrogenated Microcrystalline Films of CdTe by Chemical Sputtering in Hydrogen : Surfaces, Interfaces and Films
- O_2 Plasma Etch Rate Reduction on Synchrotron Radiation Exposed PMMA Film
- Radical Generation Mechanism and Radical Effect on Aluminum Anisotropic Etching in SiCl_4 Reactive Ion Etching
- Structural Changes and Annealing Behavior of Ar-Ion-Irradiated Superconducting BiSrCaCu0 Thin Films
- Effect of Silicon Surface Cleaning on the Initial Stage of Selective Titanium Silicide Chemical Vapor Deposition
- Work Function of a High-T_c Superconductor, YBa_2Cu_3O_7