Mechanism for Desorption of SiF_4 from SiO_2 Film Surface in HF Solutions
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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SATO Kuninori
National Institute for Fusion Science
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Sato K
Asahi Glass Co. Ltd. Yokohama Jpn
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Sato K
Faculty Of Applied Biological Science Hiroshima University
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Sato K
National Institute For Fusion Science
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Sato Kuninori
Institute For Fusion Science
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Sato K
National Defense Acad. Yokosuka Jpn
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Sato K
Faculty Of Technology Tokyo Universily Of Agriculture And Technology
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Sasaki K
Nagoya Univ. Nagoya Jpn
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Sato K
Dept. Of Energy Engineering And Science Nagoya University
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OKU Tomoki
Mitsubishi Electric Corporation, Optoelectronic and Microwave Devices Laboratory
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SATO Kazuhiko
Mitsubishi Electric Corporation, Optoelectronic and Microwave Devices Laboratory
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OTSUBO Mutsuyuki
Mitsubishi Electric Corporation, Optoelectronic and Microwave Devices Laboratory
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Oku T
Riken (inst. Physical And Chemical Res.) Saitama Jpn
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SATO Kazuo
Faculty of Education, Tokusima University
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Otsubo M
Mitsubishi Electric Corp. Itami‐shi Jpn
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OTSUBO Mutsuyuki
Mitsubishi Electric Corp.
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