Alumina Thick Films as Integral Substrates Using Aerosol Deposition Method
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概要
- 論文の詳細を見る
Alumina thick films were fabricated by the aerosol deposition method (ADM) as integral substrates for integrated RF modules. By selecting a suitable powder and deposition conditions, alumina thick films as an integral substrate were successfully grown on glass and Al substrates at room temperature by the ADM. The relative dielectric permittivity and loss tangent of the alumina thick films on Al substrates were 9.5 and 0.005, respectively. To form microstrip lines on the aerosol-deposited alumina thick films, copper electroplating and lithography were employed, and a square-type cross section with sharp edges was obtained. Low-pass LC filters with a cutoff frequency of 10 GHz were simulated by electromagnetic analysis. The possibility of miniaturization of RF modules is proposed using alumina thick films fabricated by the ADM as an integral substrate.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-08-15
著者
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MORI Naoko
Department of Fermentation Technology, Faculty of Engineering, Hiroshima University
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Kakemoto Hirofumi
Department Of Applied Physics Faculty Of Science Science University Of Tokyo
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Tsurumi Takaaki
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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Akedo Jun
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Wada Satoshi
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Nam Song-Min
Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-dong, Nowon-gu, Seoul 139-701, Korea
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Wada Satoshi
Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan
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Mori Naoko
Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan
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Wada Satoshi
Department of Applied Chemistry, Tokyo University of Agriculture & Technology,
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