Preparation of Bismuth Silicate Films on Si Wafer by Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-15
著者
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神谷 武志
東大工
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Tsurumi Takaaki
Department of Inorganic Materials, Graduate School of Science and Engineering, Tokyo Institute of Te
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Kim J
Samsung Electro-mechanics Co. Ltd
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Kim Jongsun
Samsung Electra-mechanics Co. Ltd.
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MIZUTANI Nobuyasu
Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
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Katase Takayoshi
Aterials And Structures Laboratory Tokyo Institute Of Technology
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Kamiya Toshio
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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DAIMON Masaki
Department of Inorganic materials, Faculty of Engineering, Tokyo Institute of Technology
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Daimon M
Tokyo Inst. Technol. Tokyo
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Mizutani N
Tokyo National College Of Technology
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Mizutani Nobuyasu
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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KIM Jonghee
Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
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HIRANO Hideyuki
Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
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神谷 利夫
Materials And Structures Laboratory Tokyo Institute Of Technology
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Tsurumi Takaaki
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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Mizutani Nobuyasu
Tokyo National Coll. Of Technol. Tokyo Jpn
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Hirano Hideyuki
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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Tsurumi Takaaki
Department Of Metallurgy And Ceramics Science Graduate School Of Science And Engineering Tokyo Insti
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