CHOI Rino | SEMATECH

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概要

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著作論文

Compatibility of ALD Hafnium Silicate with Dual Metal Gate CMOS Integration
Ultra-Short Pulse Current-Voltage Characterization of the Intrinsic Characteristics of High-κ Devices
NBTI Dependence on Dielectric Thickness in Ultra-scaled HfSiO Dielectric/ALD-TiN Gate Stacks
Trapping/De-Trapping Gate Bias Dependence of Hf-Silicate Dielectrics with Poly and TiN Gate Electrode
Temperature Effects of Constant Bias Stress on n-Channel FETs with Hf-based Gate Dielectric
Stress voltage polarity dependent threshold voltage shift behavior of ultrathin Hafnium oxide gated pMOSFET with TiN electrode
Effects of O_2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs
A novel inversion pulse measurement technique to investigate transient charging characteristics in high-k NMOS transistors
Improved Hot Carrier Reliability Characteristics of Metal Oxide Semiconductor Field Effect Transistors with High-$k$ Gate Dielectric by Using High Pressure Deuterium Post Metallization Annealing
Negative Bias Temperature Instability Dependence on Dielectric Thickness and Nitrogen Concentration in Ultra-scaled HfSiON Dielectric/TiN Gate Stacks
Temperature Effects of Constant Bias Stress on n-Channel FETs with Hf-based Gate Dielectric

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