Distinctive feature of ripening during growth interruption of InGaAs quantum dot epitaxy using Bi as a surfactant (Special issue: Microprocesses and nanotechnology)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• OKAMOTO Hiroshi

  Graduate School of Frontier Science, The University of Tokyo and PRESTO (JST)

• Tateno Kouta

  Ntt Basic Research Laboratories Ntt Corporation

• Kamada Hidehiko

  Ntt Basic Research Laboratories

• Gotoh Hideki

  Ntt Basic Research Laboratories

• Sogawa Tetsuomi

  Ntt Basic Research Laboratories

• Tawara Takehiko

  Ntt Basic Res. Lab. Kanagawa Jpn

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