Highly Selective ZEP/AlGaAs Etching for Photonic Crystal Structures Using Cl2/HI/Xe Mixed Plasma
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概要
- 論文の詳細を見る
We demonstrate the highly selective etching of AlGaAs photonic crystal (PhC) structures with electron beam (EB) resist masks by using Cl2/HI/Xe mixed plasma. We found that the Cl2/HI plasma etches the AlGaAs layer while suppressing EB mask etching, and the addition of Xe eliminates damage to the EB mask caused by radicals. With this balanced approach, we achieved a 3-fold increase in the etching selectivity of the etching rate ratio of AlGaAs/resist. Moreover, using these conditions we successfully fabricated an AlGaAs PhC slab with a fine structure and very small air holes that had a radius of 48 nm and a lattice constant of 240 nm.
- Japan Society of Applied Physicsの論文
- 2006-09-25
著者
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Notomi Masaya
Ntt Basic Research Laboratories
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Kuramochi Eiichi
Ntt Basic Research Laboratories Ntt Corporation
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Tateno Kouta
Ntt Basic Research Laboratories Ntt Corporation
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Tanabe Takasumi
Ntt Basic Research Laboratories Ntt Corporation
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Nakano Hidetoshi
Ntt Basic Research Laboratories
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Tawara Takehiko
Ntt Basic Res. Lab. Kanagawa Jpn
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Kuramochi Eiichi
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Ito Tetsu
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Tateno Kouta
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Tanabe Takasumi
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Notomi Masaya
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Tawara Takehiko
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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