Improvement of Spatial Resolution in Raman Spectroscopy Selecting Measurement Area by Opaque Material Deposition

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概要

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• We have succeeded in the strain analysis beyond the spatial resolution in conventional Raman measurements, which can be achieved by selecting the strain-induced measurement area by an opaque material. Tungsten (W) film deposited by electron beam (EB)-assisted deposition was used for the opaque material in this study. The EB-W film has the properties of a relatively high absorption coefficient and a low density. These features give rise to shading of the excitation light without stress induction into Si. As a result, the wave number shift of 0.86 cm-1 was obtained in the Si substrate with 100-nm-wide space SiN pattern, whose value was higher than that obtained in conventional Raman measurements, 0.3--0.4 cm-1. Furthermore, the spatial resolution of Raman spectroscopy with the W film deposition was better than that of Raman spectroscopy with an immersion lens. We can say that the methodology is a promising candidate to measure strain in fine structures.

• 2011-06-25

著者

• Kosemura Daisuke

  School Of Science And Engineering Meiji University

• Ogura Atsushi

  School Of Science And Engineering Meiji University

• Akamatsu Hiroaki

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Takei Munehisa

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Nagata Kohki

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Nagata Kohki

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

• Takei Munehisa

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

• Akamatsu Hiroaki

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

• Kosemura Daisuke

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

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