Akamatsu Hiroaki | School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

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概要

• Akamatsu Hiroakiの詳細を見る
• 同名の論文著者
• School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japanの論文著者

関連著者

• Kosemura Daisuke

  School Of Science And Engineering Meiji University

• Ogura Atsushi

  School Of Science And Engineering Meiji University

• Akamatsu Hiroaki

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Takei Munehisa

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Nagata Kohki

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Nakanishi Toshio

  Tokyo Electron At Ltd. Hyogo Jpn

• Kohno Masayuki

  Tokyo Electron At Spa Development Engineering Dept.

• Nishita Tatsuo

  Tokyo Electron At Spa Development Engineering Dept.

• Nagata Kohki

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

• Takei Munehisa

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

• Tomita Motohiro

  School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• Nishita Tatsuo

  Tokyo Electron AT, SPA Development Engineering Department, 1-8 Fuso-cho, Amagasaki, Hyogo 660-0891, Japan

• Akamatsu Hiroaki

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

• Kohno Masayuki

  Tokyo Electron AT, SPA Development Engineering Department, 1-8 Fuso-cho, Amagasaki, Hyogo 660-0891, Japan

• Nakanishi Toshio

  Tokyo Electron AT, SPA Development Engineering Department, 1-8 Fuso-cho, Amagasaki, Hyogo 660-0891, Japan

• Kosemura Daisuke

  School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan

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著作論文

• Evaluation of Strained-Silicon by Electron Backscattering Pattern Measurement: Comparison Study with UV-Raman Measurement and Edge Force Model Calculation
• Study of Strain Induction for Metal–Oxide–Semiconductor Field-Effect Transistors using Transparent Dummy Gates and Stress Liners
• Improvement of Spatial Resolution in Raman Spectroscopy Selecting Measurement Area by Opaque Material Deposition

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