High Speed, Low Power Programming in 0.17μm Channel Length NOR-type Floating Gate Flash Memory Cell Free of Drain Turn-On Effects
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概要
- 論文の詳細を見る
We present a fast low power programming in floating gate electrically erasable and programmable read only memory (EEPROM) cells with the aspect ratio of 0.09 / 0.17 μm. The threshold voltage shift ($\Delta V_{\text{TH}}$) of 5V, for example, was done in less than 1 μs, using the peak drain current ($I_{\text{D}}$) of ${\approx}100$ μA. More importantly, by using the substrate bias ($V_{\text{B}}$), programming was done in 2–3 μs at $I_{\text{D}}$ of 30 μA and $V_{\text{D}}$ of 3V. This observed speed is faster than reported values by about 2.5 and power used was about 50% lower than the previous one. The optimal programming bias conditions are presented, together with the reasons for fast programming.
- Japan Society of Applied Physicsの論文
- 2004-02-01
著者
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QUAN Wu-yun
Korea institute for Advanced Study
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KIM Bomsoo
Korea Institute for Advanced Study
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Kim Dae
Korea Atomic Energy Research Institute
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Min Hong
School Of Electrical Engineering & Isrc Seoul National University
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BAEK Chang-Ki
School of Electrical Engineering and Computer Science and Nano-Systems Institute (NSI-NCRC), Seoul N
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SONG Yunheub
Memory Division, Semiconductor Business, Samsung Electronics Company, Ltd.
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Park Young
School Of Electrical And Computer Engineering Sungkyunkwan University
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Baek Chang-Ki
School of Electrical Engineering and Computer Science, and ISRC, Seoul National University, P.O. Box 34 Kwanak, Seoul 151-744, Korea
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Song Yunheub
Memory Division, Semiconductor Business, Samsung Electronics Company, Ltd., Kyungki-Do 449-900, Korea
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Park Young
School of Electrical Engineering and Computer Science, and ISRC, Seoul National University, P.O. Box 34 Kwanak, Seoul 151-744, Korea
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Min Hong
School of Electrical Engineering and Computer Science, and ISRC, Seoul National University, P.O. Box 34 Kwanak, Seoul 151-744, Korea
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Kim Bomsoo
Korea Institute for Advanced Study, 207-43 Cheongryangri, Seoul, Korea
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