Crystallization of Amorphous GeSe_2 Semiconductor by Isothermal Annealing without Light Radiation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-03-15
著者
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Ikari T
Miyazaki Univ. Miyazaki Jpn
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Ikari Tetsuo
Department Of Electronic Engineering Miyazaki University
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Ikari Tetsuo
Department Of Electrical And Electronic Engineering Miyazaki University
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Ikari Tetsuo
Department Of Electrical And Electronic Engineering University Of Miyazaki
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Yoshino Kenji
Department Of Electrical And Electronic Engineering Miyazaki University
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Yoshino Kenji
Department Of Anatomy Nihon University School Of Dentistry At Matsudo
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Maeda K
Department Of Electrical And Electronic Engineering Miyazaki University
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FUKUYAMA Atsuhiko
Department of Electronics, Miyazaki University
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Sakai Kentaro
Department Of Environmental Science Faculty Of Human Life Science Hiroshima Jogakuin University
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Sakai Kiyomi
Kansai Advanced Research Center Communications Research Laboratory The Ministry Of Posts And Telecom
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Sakai K
宮崎大
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Maeda Kouji
Department Of Electrical And Electronic Engineering Miyazaki University
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FUKUYAMA Atsuhiko
Faculty of Engineering, Miyazaki University
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Fukuyama A
Miyazaki Univ. Miyazaki Jpn
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Fukuyama Atsuhiko
Department Of Materials Science Miyazaki University
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Yokoyama Hirosumi
Department Of Electrical And Electronic Engineering Miyazaki University
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Maeda Kouji
Department Of Cardiology Hiroshima General Hospital
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Fukuyama Atsuhiko
Department of Applied Physics, Miyazaki University, 1-1 Gakuen Kibanadai-nishi, Miyazaki 889-2192, Japan
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