Fukuyama Atsuhiko | Department Of Materials Science Miyazaki University
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概要
関連著者
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Ikari Tetsuo
Department Of Electronic Engineering Miyazaki University
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FUKUYAMA Atsuhiko
Department of Electronics, Miyazaki University
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Fukuyama Atsuhiko
Department Of Materials Science Miyazaki University
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Ikari T
Miyazaki Univ. Miyazaki Jpn
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Ikari Tetsuo
Department Of Electrical And Electronic Engineering Miyazaki University
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Ikari Tetsuo
Department Of Electrical And Electronic Engineering University Of Miyazaki
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FUKUYAMA Atsuhiko
Faculty of Engineering, Miyazaki University
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Fukuyama A
Miyazaki Univ. Miyazaki Jpn
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Fukuyama Atsuhiko
Department of Applied Physics, Miyazaki University, 1-1 Gakuen Kibanadai-nishi, Miyazaki 889-2192, Japan
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Maeda K
Department Of Electrical And Electronic Engineering Miyazaki University
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Maeda Kouji
Department Of Electrical And Electronic Engineering Miyazaki University
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Maeda Kouji
Department Of Cardiology Hiroshima General Hospital
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Yoshino Kenji
Department Of Electrical And Electronic Engineering Miyazaki University
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Yoshino Kenji
Department Of Anatomy Nihon University School Of Dentistry At Matsudo
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MAEDA Kouji
Department of Mechanical and System Engineering, University of Hyogo
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Yokoyama Hirosumi
Department Of Electrical And Electronic Engineering Miyazaki University
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Ikari Tetsuo
Faculty Of Engineering University Of Miyazaki
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Sakai Kiyomi
Kansai Advanced Research Center Communications Research Laboratory The Ministry Of Posts And Telecom
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Sakai K
宮崎大
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Memon Aftab
Department Of Electrical And Electronic Engineering Miyazaki University
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NIKI Shigeru
Optoelectronics Division, Electrotechnical Laboratory
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Futagami K
Kyushu Sangyo Univ. Fukuoka Jpn
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Futagami Koji
Department of Electronics, Miyazaki University
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AKASHI Yoshito
Department of Materials Engineering, Miyazaki University
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Sakai Kentaro
Department Of Environmental Science Faculty Of Human Life Science Hiroshima Jogakuin University
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Toyoda Taro
Department Of Applied Physics And Chemistry The University Of Electro-communications
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Niki Shigeru
Optoelectronics Division Electrotechnical Laboratory
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Futagami Koji
Department Of Applied Physics Faculty Of Engineering Kyushu University
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Akashi Yoshito
Department Of Materials Science Faculty Of Engineering Miyazaki University
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Akashi Yoshito
Department Of Applied Physics Faculty Of Engineering Kyushu University
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Nagatomo Hiroaki
Department of Electrical and Electronic Engineering, Miyazaki University
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Yokoyama Hirosumi
Department of Electrical and Electronic Engineering, Miyazaki University
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MOROOKA Yukihiro
Department of Electrical and Electronic Engineering, Miyazaki University
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SAKAI Kentaro
Materials Research Center, Miyazaki University
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IWAMOTO Masatoshi
Department of Electrical and Electronic Engineering, Miyazaki University
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Toyoda Taro
Department Of Applied Physics And Chemistry University Of Electro-communications
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Morooka Yukihiro
Department Of Electrical And Electronic Engineering Miyazaki University
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Nagatomo Hiroaki
Department Of Electrical And Electronic Engineering Miyazaki University
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Iwamoto Masatoshi
Department Of Electrical And Electronic Engineering Miyazaki University
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Iwamoto Masatoshi
Department Of Applied Physics Faculty Of Technology Tohoku Gakuin University
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Niki Shigeru
Optoelectronic Materials and Devices Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Spatial Distribution of EL2 in GaAs Wafer Determined by Photoacoustic Spectroscopy
- Near Band Edge Non-radiative Recombination of Si Single Crystal Investigated by Piezoelectric Photothermal Spectroscopy
- Non-Radiative Carrier Recombination Process in AlGaAs/GaAs Hetero-Structure investigated by Piezoelectric Photothermal Spectroscopy
- Piezoelectric Photoacoustic and Photoluminescence Properties of CuIn_XGa_Se_2 Alloys
- Nonradiative Investigation of Hole Photoionization Spectrum of EL2 in Carbon Concentration Controlled Semi-Insulating GaAs
- Piezoelectric Photothermal Spectra of Co Doped ZnO Semiconductor
- Crystallization of Amorphous GeSe_2 Semiconductor by Isothermal Annealing without Light Radiation