Study of Hydrogen Ion Bombardment Effect on the Growth of Si:H Films Prepared by Hydrogen Plasma Sputtering of Silicon

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-07-15

著者

• Sun Yong

  Department Of Burns & Plastic Surgery Beijing Ji-shui-tan Hospital

• NISHITANI Ryusuke

  Department of Electrical and Electronics Engineering, University of the Ryukyus

• MIYASATO Tatsuro

  Department of Computer Science and Electronics, Kyushu Institute of Technology

• Sun Y

  Department Of Applied Physics Hebei University Of Technology

• Nishitani R

  Kyushu Inst. Technol. Fukuoka Jpn

• Nishitani Ryusuke

  Department Of Computer Science And Electronics Kyushu Institute Of Technology

• Sun Yong

  Department Of Computer Science The Queen's University Of Belfast

• Sun Y

  Toshiba Res. Europe Ltd. Bristol Gbr

• Miyasato T

  Kyushu Institute Of Technology

• Miyasato Tatsuro

  Department Of Computer Science And Electronics Kyushu Institute Of Technology

• Sun Yong

  Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology

• Miyasato Tatsuro

  Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology

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