Sun Yong | Department Of Burns & Plastic Surgery Beijing Ji-shui-tan Hospital
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概要
関連著者
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Sun Yong
Department Of Burns & Plastic Surgery Beijing Ji-shui-tan Hospital
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Sun Yong
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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Sun Yong
Department Of Computer Science The Queen's University Of Belfast
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Miyasato Tatsuro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sun Y
Toshiba Res. Europe Ltd. Bristol Gbr
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Sun Y
Department Of Applied Physics Hebei University Of Technology
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Miyasato T
Kyushu Institute Of Technology
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Miyasato Tatsuro
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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MIYASATO Tatsuro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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MIYASATO Tatsuro
Kyushu Institute of Technology
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NISHITANI Ryusuke
Department of Electrical and Electronics Engineering, University of the Ryukyus
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SONODA Nobuo
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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Nishitani R
Kyushu Inst. Technol. Fukuoka Jpn
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Nishitani Ryusuke
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sonoda Nobuo
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Sonoda N
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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CHANG Kow
Department of Electronic Engineering and Institute of Electronics, National Chiao Tung University, N
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ENOKIDA Toyotsugu
Quality Evaluation and Chemical Analysis Department, Fukuryou Semicon Engineering Corporation
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HAGINO Hiroyasu
Quality Evaluation and Chemical Analysis Department, Fukuryou Semicon Engineering Corporation
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Hagino H
Technology Research Institute Of Osaka Prefecture
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Enokida T
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Lee Tzyh
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Hagino Hiroyasu
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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大場 充
広島市立大学情報科学研究科
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大場 充
広島市大
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劉 少英
広島市立大学情報科学部
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TONOUCHI Masayoshi
Department of Computer Science and Electronics, Kyushu Institute of Technology
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大場 充
広島市立大学
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AYABE Tokihiro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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Ayabe Tokihiro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sun Yong
Department Of Electronics Engineering And Institute Of Electronics Of National Chiao-tung University
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Chang K
National Chiao‐tung Univ. Hsin‐chu Twn
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劉 少英
広島市立大学 情報科学部 情報数理学科
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Tonouchi Masayoshi
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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LEE Tzyh
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Lee Tzyh
Department Of Electronics Engineering And Institute Of Electronics Of National Chiao-tung University
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Sun Yong
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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CHEN Hong
Department of Pediatrics, The Third Affiliated Hospital, Sun Yat-sen University
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Chen Hong
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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MASUDA Koichiro
Semiconductor Laboratory, Exploitation of Next Generation Co., Ltd
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KIRIMOTO Kenta
Department of Computer Science and Electronics, Kyushu Institute of Technology
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WATARI Yoshihiko
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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MIYASATO Tatsuro
Center for Microelectronics Systems, Kyushu Institute of Technology
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Kirimoto Kenta
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sun Yong
Department Of Information And Computer Science Keio University
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Sakama Hiroshi
Applied Technology Research Center Nkk Corporation:(present Address) Department Of Applied Physics T
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Chen Hong
Department Of Biology Shenyang Teachers' College:(present Address)biological Laboratory Sapporo
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CHUNG Yuan
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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SAKAMA Hiroshi
Advanced Technology Research Center, NKK Corporation
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OHMURA Masaki
Advanced Technology Research Center, NKK Corporation
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Masuda Koichiro
Semiconductor Laboratory Exploitation Of Next Generation Co. Ltd
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Chung Y
National Chiao‐tung Univ. Hsin‐chu Twn
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Chung Yuan
Department Of Electronics Engineering And Institute Of Electronics Of National Chiao-tung University
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WANG Ze-Jian
School of Pharmacy, Shanghai Jiaotong University
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SONG Li
School of Pharmacy, Shanghai Jiaotong University
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GUO Lin-Chen
School of Pharmacy, Shanghai Jiaotong University
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YIN Min
School of Pharmacy, Shanghai Jiaotong University
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Miyasato Tatsuro
Department Of Computer Science And Electronics Kyushu Institute Of Technology:center For Microelectr
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Sun Yong
Department Of Computer Science And Electronics Kyushu Institute Of Technology:(present Address) Shen
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OZAWA Shinji
Department of Information and Computer Science, Keio University
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OHMURA Masashi
Department of Electrical and Computer Engineering, Faculty of Technology, Kanazawa University
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Ohmura M
Tokyo Inst. Technol. Yokohama Jpn
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NAKATUGI Kkoichiro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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Nakatugi Kkoichiro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Watari Yoshihiko
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Ozawa Shinji
Department Of Information And Computer Science Keio University
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Ozawa Shinji
Department Of Electrical Engineering Keio University
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Wang Ze-jian
School Of Pharmacy Shanghai Jiaotong Univ.
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Chang Kow
Department of Electronics Engineering and Institute of Electronics of National Chiao-Tung University, Hsin-Chu, Taiwan, Republic of China
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SUN Yong
Department of Traditional Chinese Medicine, Sixth People's Hospital, Shanghai Jiaotong University
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MIYASATO Tatsuro
Department of Computer Science and Electronics, Kyushu Institute of Technology:Center for Microelectronics Systems (CMS), Kyushu Institute of Technology
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SUN Yong
Department of Computer Science and Electronics, Kyushu Institute of Technology
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Lee Tzyh
Department of Electronics Engineering and Institute of Electronics of National Chiao-Tung University, Hsin-Chu, Taiwan, Republic of China
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Nakatsugi Kyoichiro
Department of Computer Science and Electronics, Kyushu Institute of Technology
著作論文
- The Extensive Burns Treatment in China
- プロセス・モデリングと高信頼性システム
- プロセス・モデリングと高信頼性システム
- Void free at Interface of the SiC Film and Si Substrate
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- Growth of 3C-SiC on Si Substrate with Ge_C_ Buffer Layer : Semiconductors
- Influence of Oxygen on Formation of Hollow Voids at SiC/Si Interface : Semiconductors
- Fabrication of Nanoscale Cubic SiC Particle Film
- Compositional Changes of SiC/Si Structure during Vacuum Annealing
- Activation Energy of Nanoscale 3C-SiC Island Growth on Si Substrate
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- Infrared Absorption Properties of Nanocrystalline Cubic SiC Films
- Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrate
- Observation of the Formation Processes of Hollow Voids at the Interface between SiC Film and Si Substrate
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- Study of Hydrogen Ion Bombardment Effect on the Growth of Si:H Films Prepared by Hydrogen Plasma Sputtering of Silicon
- Study of the Growth Mechanism of Nanocrystalline Si:H Films Prepared by Reactive Hydrogen Plasma Sputtering of Silicon
- Temperature-Dependent Reaction of rf Hydrogen Plasma with Silicon
- Study of Sputtering Mechanism of Silicon with Hydrogen Plasma Controlled by Magnetic Field
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- Comparison of the Characteristics of Polyoxides Grown by Thermal, Rapid Thermal Oxidation, and Tetraethylorthosilicate Deposition Methods
- Efficient Wavelet-Based Image Retrieval Using Coarse Segmentation and Fine Region Feature Extraction(Image Processing and Video Processing)
- Improvement of Annealing Properties of SiC/Si Structure
- Characterization of Stress in Porous Silicon Films Prepared by Reactive Hydrogen Plasma Sputtering Technique
- Stress Release Behaviors of Amorphous SiC/Si Structure during Annealing : Semiconductors
- Loss Behaviors of Si Substrate during Growth of the SiC Films Prepared by Hydrogen Plasma Sputtering
- Plasma Etch Void Formed at the SiC Film/Si Substrate Interface
- The Effect of the Growth Temperature on Polyoxide by Rapid Thermal Processing