Study of the Growth Mechanism of Nanocrystalline Si:H Films Prepared by Reactive Hydrogen Plasma Sputtering of Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-01
著者
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Sun Yong
Department Of Burns & Plastic Surgery Beijing Ji-shui-tan Hospital
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NISHITANI Ryusuke
Department of Electrical and Electronics Engineering, University of the Ryukyus
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Sun Y
Department Of Applied Physics Hebei University Of Technology
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MIYASATO Tatsuro
Center for Microelectronics Systems, Kyushu Institute of Technology
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Nishitani R
Kyushu Inst. Technol. Fukuoka Jpn
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Nishitani Ryusuke
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sun Yong
Department Of Computer Science The Queen's University Of Belfast
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Sun Yong
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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SUN Yong
Department of Computer Science and Electronics, Kyushu Institute of Technology
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