Sun Y | Department Of Applied Physics Hebei University Of Technology
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概要
関連著者
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Sun Y
Department Of Applied Physics Hebei University Of Technology
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Sun Yong
Department Of Burns & Plastic Surgery Beijing Ji-shui-tan Hospital
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Sun Yong
Department Of Computer Science The Queen's University Of Belfast
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Sun Yong
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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Sun Y
Toshiba Res. Europe Ltd. Bristol Gbr
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Miyasato T
Kyushu Institute Of Technology
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MIYASATO Tatsuro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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Miyasato Tatsuro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Miyasato Tatsuro
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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Sun Yijun
Acupuncture College Beijing University Of Chinese Medicine
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MIYASATO Tatsuro
Kyushu Institute of Technology
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SONODA Nobuo
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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Sonoda Nobuo
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Sonoda N
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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EGAWA Takashi
Research center for Nano-Device and System, Nagoya Institute of Technology
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ZHANG Liangying
Functional Materials Research Laboratory, Tongji University
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YAO Xi
Functional Materials Research Laboratory, Tongji University
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NISHITANI Ryusuke
Department of Electrical and Electronics Engineering, University of the Ryukyus
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Zhang L
Functional Materials Research Laboratory Tongji University
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ENOKIDA Toyotsugu
Quality Evaluation and Chemical Analysis Department, Fukuryou Semicon Engineering Corporation
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HAGINO Hiroyasu
Quality Evaluation and Chemical Analysis Department, Fukuryou Semicon Engineering Corporation
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Nishitani R
Kyushu Inst. Technol. Fukuoka Jpn
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Nishitani Ryusuke
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Hagino H
Technology Research Institute Of Osaka Prefecture
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Enokida T
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Hagino Hiroyasu
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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Egawa Takashi
Research Center For Nano-device And System Nagoya Institute Of Technology
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Egawa Takashi
Research Laboratory Oki Electric Industry Co. Ltd.
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Yao X
Functional Materials Research Laboratory Tongji University
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Yao Xi
Electronic Materials Research Laoratory Xi'an Jiaotong University
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Zhang Liangying
Electronic Materials Research Laoratory Xi'an Jiaotong University
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Zhang Liangying
Functional Materials Research Laboratory Tongji University
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Zhang L
National Institute Of Advanced Industrial Science And Technology
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SUN Yubao
Department of Applied Physics, Hebei University of Technology
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MA Hongmei
Department of Applied Physics, Hebei University of Technology
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ZHANG Zhidong
Department of Applied Physics, Hebei University of Technology
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SUN Yijun
Venture Business Laboratory, Nagoya Institute of Technology
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AYABE Tokihiro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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Ayabe Tokihiro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Zhang Z
Department Of Applied Physics Hebei University Of Technology
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Yao Xi
Functional Materials Research Laboratory Tongji University
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Zhang L
Institute Of Mechanical System Engineering National Institute Of Advanced Industrial Science And Tec
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Egawa Takashi
Research Center for Micro-Structure Devices, Nagoya Institute of Technology
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SHAO Chunlin
Research Center for Nano-Device and System, Nagoya Institute of Technology
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SUN Yijun
Research Center for Nano-Device and System, Nagoya Institute of Technology
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Liu C
東京電機大 工
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Liu Chao
Department Of Computer Science National Chung-hsing University
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LI Zaidong
Department of Applied Physics, Hebei University of Technology
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MASUDA Koichiro
Semiconductor Laboratory, Exploitation of Next Generation Co., Ltd
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KIRIMOTO Kenta
Department of Computer Science and Electronics, Kyushu Institute of Technology
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WATARI Yoshihiko
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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MIYASATO Tatsuro
Center for Microelectronics Systems, Kyushu Institute of Technology
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Kirimoto Kenta
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sun Yubao
Department Of Applied Physics Hebei University Of Technology
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Ma Hongmei
Department Of Applied Physics Hebei University Of Technology
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Machi Y
Department Of Electronic Engineering Tokyo Denki University
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LIU Tianjun
Acupuncture College, Beijing University of Chinese Medicine
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MACHI Yoshio
Department of Electronic Engineering, Tokyo Denki University
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Liu T
Acupuncture College Beijing University Of Chinese Medicine
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Machi Yoshio
Department Of Electronic Engineering Tokyo Denki University
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Masuda Koichiro
Semiconductor Laboratory Exploitation Of Next Generation Co. Ltd
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Watari Yoshihiko
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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SUN Yong
Department of Computer Science and Electronics, Kyushu Institute of Technology
著作論文
- Formation Mechanism for High-Surface-Area Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition
- Critical Voltage of π-Cell Liquid Crystal Displays
- Void free at Interface of the SiC Film and Si Substrate
- Effect of Collection Distance on the Lattice Structure of Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition : Structure and Mechanical and Thermal Properties of Condensed Matter
- High Anatase-Rutile Transformation Temperature of Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition : Structure and Mechanical and Thermal Properties of Condensed Matter
- Novel Mode of Liquid Crystal Display with Narrow Viewing Angle(Structure and Mechanical and Thermal Properties of Condensed Matter)
- Conversion of Si(100) to Si_Ge_xC_y Alloy by Hydrogen Plasma Containing Ge and C Species
- Growth of 3C-SiC on Si Substrate with Ge_C_ Buffer Layer : Semiconductors
- Influence of Oxygen on Formation of Hollow Voids at SiC/Si Interface : Semiconductors
- Fabrication of Nanoscale Cubic SiC Particle Film
- Compositional Changes of SiC/Si Structure during Vacuum Annealing
- Activation Energy of Nanoscale 3C-SiC Island Growth on Si Substrate
- Influence of SiC Cover Layer of Si Substrate on Properties of Cubic SiC Films Prepared by Hydrogen Plasma Sputtering
- Infrared Absorption Properties of Nanocrystalline Cubic SiC Films
- Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrate
- Observation of the Formation Processes of Hollow Voids at the Interface between SiC Film and Si Substrate
- Low-Temperature Growth of Oriented Silicon Carbide on Silicon by Reactive Hydrogen Plasma Sputtering Technique
- Study of Hydrogen Ion Bombardment Effect on the Growth of Si:H Films Prepared by Hydrogen Plasma Sputtering of Silicon
- Study of the Growth Mechanism of Nanocrystalline Si:H Films Prepared by Reactive Hydrogen Plasma Sputtering of Silicon
- Temperature-Dependent Reaction of rf Hydrogen Plasma with Silicon
- The Experimental Study on the Effects of Pause Breathing Patterns on Heart Rate Variability(International Conference on Mind Body Science : Physical and Physiological Approach joint with The Eighteenth Symposium on Life Information Science)