Miyasato T | Kyushu Institute Of Technology
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概要
関連著者
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Miyasato T
Kyushu Institute Of Technology
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Sun Yong
Department Of Burns & Plastic Surgery Beijing Ji-shui-tan Hospital
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Sun Yong
Department Of Computer Science The Queen's University Of Belfast
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Sun Yong
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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Sun Y
Department Of Applied Physics Hebei University Of Technology
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Sun Y
Toshiba Res. Europe Ltd. Bristol Gbr
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Miyasato Tatsuro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Miyasato Tatsuro
Department of Applied Science for Integrated System Engineering, Graduate School of Engineering, Kyushu Institute of Technology
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MIYASATO Tatsuro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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MIYASATO Tatsuro
Kyushu Institute of Technology
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SONODA Nobuo
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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Sonoda Nobuo
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Sonoda N
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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ENOKIDA Toyotsugu
Quality Evaluation and Chemical Analysis Department, Fukuryou Semicon Engineering Corporation
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HAGINO Hiroyasu
Quality Evaluation and Chemical Analysis Department, Fukuryou Semicon Engineering Corporation
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Hagino H
Technology Research Institute Of Osaka Prefecture
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Enokida T
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
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Hagino Hiroyasu
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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NISHITANI Ryusuke
Department of Electrical and Electronics Engineering, University of the Ryukyus
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Nobugai Kohji
The Institute of Scientific and Industrial Research, Osaka University
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KIRIMOTO Kenta
Department of Computer Science and Electronics, Kyushu Institute of Technology
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AYABE Tokihiro
Department of Computer Science and Electronics, Kyushu Institute of Technology
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Kirimoto K
Faculty Of Computer Science And Systems Engineering Kyushu Institute Of Technology
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Kirimoto Kenta
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Ayabe Tokihiro
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Nishitani R
Kyushu Inst. Technol. Fukuoka Jpn
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Nishitani Ryusuke
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Sakama Hiroshi
Applied Technology Research Center Nkk Corporation:(present Address) Department Of Applied Physics T
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Tonouchi Masayoshi
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Nobugai Kohji
The Institute Of Scientific And Industrial Research Osaka University
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OHMURA Masashi
Department of Electrical and Computer Engineering, Faculty of Technology, Kanazawa University
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Ohmura M
Tokyo Inst. Technol. Yokohama Jpn
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TONOUCHI Masayoshi
Department of Computer Science and Electronics, Kyushu Institute of Technology
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MASUDA Koichiro
Semiconductor Laboratory, Exploitation of Next Generation Co., Ltd
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WATARI Yoshihiko
Quality Evaluation and Chemical Analysis Department, Fukuryo Semicon Engineering Corporation
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OHTA Michihiro
Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology
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KIRIMOTO Kenta
Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology
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WIGMORE J.Keith
Department of Physics, Lancaster University
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Ohta Michihiro
Faculty Of Computer Science And Systems Engineering Kyushu Institute Of Technology
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Wigmore J.keith
Department Of Physics Lancaster University
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SAKAMA Hiroshi
Advanced Technology Research Center, NKK Corporation
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OHMURA Masaki
Advanced Technology Research Center, NKK Corporation
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Masuda Koichiro
Semiconductor Laboratory Exploitation Of Next Generation Co. Ltd
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Sun Yong
Department Of Computer Science And Electronics Kyushu Institute Of Technology:(present Address) Shen
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OHMURA Masanori
Applied Technology Research Center, NKK Corporation
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Watari Yoshihiko
Quality Evaluation And Chemical Analysis Department Fukuryo Semicon Engineering Corporation
著作論文
- Void free at Interface of the SiC Film and Si Substrate
- Conversion of Si(100) to Si_Ge_xC_y Alloy by Hydrogen Plasma Containing Ge and C Species
- Growth of 3C-SiC on Si Substrate with Ge_C_ Buffer Layer : Semiconductors
- Influence of Oxygen on Formation of Hollow Voids at SiC/Si Interface : Semiconductors
- Fabrication of Nanoscale Cubic SiC Particle Film
- Compositional Changes of SiC/Si Structure during Vacuum Annealing
- Activation Energy of Nanoscale 3C-SiC Island Growth on Si Substrate
- Influence of SiC Cover Layer of Si Substrate on Properties of Cubic SiC Films Prepared by Hydrogen Plasma Sputtering
- Infrared Absorption Properties of Nanocrystalline Cubic SiC Films
- Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrate
- Observation of the Formation Processes of Hollow Voids at the Interface between SiC Film and Si Substrate
- Low-Temperature Growth of Oriented Silicon Carbide on Silicon by Reactive Hydrogen Plasma Sputtering Technique
- Study of Hydrogen Ion Bombardment Effect on the Growth of Si:H Films Prepared by Hydrogen Plasma Sputtering of Silicon
- Temperature-Dependent Reaction of rf Hydrogen Plasma with Silicon
- Internal Friction Due to Localized Relaxation around Y-ions in Single Crystal Yttria-Stabilized Zirconia : Structure and Mechanical and Thermal Properties of Condensed Matter
- Ultrasonic Attenuation Due to Localized Relaxation in Cubic Yttria-Stabilized Zirconia
- Room-Temperature Synthesis of ZnS:Mn Films by H_2 Plasma Chemical Sputtering
- Growth Mechanism of ZnS:Mn Films Obtained by Hydrogen Plasma Sputtering and Its Application to a Thin-Film Electroluminescent Device