Photo-Chemical Vapor Deposition of Al_2O_3 Thin Films with High Quantum Yield

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-03-01

著者

• MATSUMURA Naoki

  Department of Applied Physics, Hokkaido University

• SARAIE Junji

  Department of Electronics and Information Science, Kyoto Institute of Technology

• Matsumura Naoki

  Department Of Applied Physics Hokkaido University

• Matsumura N

  Kyoto Inst. Technol. Kyoto Jpn

• Saraie J

  Kyoto Inst. Of Technol. Kyoto Jpn

• Saraie Junji

  Department Of Electronic Engineering Faculty Of Engineering Kyoto University

• MATSUMURA Nobuo

  Department of Electronics and Information Science, Faculty of Engineering and Design, Kyoto Institut

• Matsumura Nobuo

  Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute

• FUKUSHIMA Yasumori

  Department of Electronics and Information Science, Faculty of Engineering and Design, Kyoto Institut

• Fukushima Y

  Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute

• HIGASHINO Tomohiko

  Department of Electronics and Information Science, Faculty of Engineering and Design, Kyoto Institut

• HIGASHINO Toshiyuki

  Research Institute for Advanced Science and Technology, Osaka Prefecture University

• Higashino T

  Research Institute For Advanced Science And Technology Osaka Prefecture University

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