Temperature Effects on the Structure of Polycrystalline Silicon Films by Glow-Discharge Decomposition Using SiH_4/SiF_4

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-03-15

著者

• Inokuma T

  Department Of Electronics Faculty Of Technology Kanazawa University

• Inokuma Takao

  Department Of Electronics Kanazawa University

• Inokuma Takao

  Department Of Electronics Faculty Of Technology Kanazawa University

• HASEGAWA Seiichi

  Department of Electronics, Faculty of Technology, Kanazawa University

• KURATA Yoshihiro

  Department of Electronics, Faculty of Technology, Kanazawa University

• SYED Moniruzzaman

  Department of Electronics, Faculty of Technology, Kanazawa University

• Kurata Y

  Precision Technology Development Center Sharp Corporation

• Hasegawa Seiichi

  Department Of Electronics Faculty Of Technology Kanazawa University

• Kurata Yoshihiro

  Department Of Electronics Faculty Of Technology Kanazawa University

• Syed Moniruzzaman

  Department Of Electronics Faculty Of Technology Kanazawa University

• Hasegawa Seiichi

  Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University

関連論文

• Mechanical Stress Caused by Adsorption of O or N on Ga-terminated (100) GaAs Surface and InAl-terminated (100) InAlAs Surface : Degradation of Insulator/Semiconductor Interface
• Studies of Effects of Adsorption of Silicon or Germanium on the Electronic States of (100) GaAs Surfaces
• Oxygen and Sulfur Adsorption Effects on Electronic States of GaAs(100) Surfaces Studied with Discrete Variational Xα Method
• Structural and Electrical Characterization of Oxidated, Nitridated and Oxi-nitridated (100) GaAs Surfaces
• Properties of "Stoichiometric" Silicon Oxynitride Films
• Structural Properties of Ultrathin Amorphous Silicon Oxynitride Layers
• Effects of Plasma-Pretreatment on Substrates before Deposition of Polycrystalline Silicon Films(Surfaces, Interfaces, and Films)
• Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition(Optical Properties of Condensed Matter)
• Influence of Organic Contamination on Silicon Dioxide Integrity
• Effects of Addition of SiF_4 During Growth of Nanocrystalline Silicon Films Deposited at 100℃ by Plasma-Enhanced Chemical Vapor Deposition
• Temperature Effects on the Structure of Polycrystalline Silicon Films by Glow-Discharge Decomposition Using SiH_4/SiF_4
• Effects of Nitrogen Addition to Fluorinated Silicon Dioxide Films
• Initial Growth of Polycrystalline Silicon Films on Substrates Subjected to Different Plasma Treatments
• Effects of the Addition of SiF_4 to the SiH_4 Feed Gas for Depositing Polycrystalline Silicon Films at Low Temperature
• Stress in Amorphous SiO_x:H Films Prepared by Plasma-Enhanced Chemical Vapor Deposition
• Properties of "Stoichiometric" Silicon Oxynitride Films
• Effects of Deposition Temperature on Strain in Polycrystalline SiC Films Deposited by Radio-Frequency Glow Discharge
• Pressure Effects on CdS Microcrystals Embedded in Germanate Glasses
• Raman Scattering of Amorphous Semiconductors Ge-S System under High Hydrostatic Pressure
• Optical Pickup Employing a Hologram-Laser-Photodiode Unit
• INVESTIGATION OF CLINICAL CHARACTERISTICS OF VENTRICULAR EXTRASYSTOLE IN CHILDREN : Using Two Dimensional RR Interval Plotting Method
• Evaluation of Optical Absorption Coefficients of a-SiN:H Films by Photothermal Deflection Spectroscopy(PDS) : Photoacoustic Spectroscopy
• AC Discharge Characteristics of a Needle-to-Semicircular-Electrode Gap with Solid Dielectric Surface under High Humidity : Nuclear Science, Plasmas and Electric Discharges
• Flashover Characteristics of Impulse Voltages on Solid Dielectric Surfaces under High Humidity
• Integrated Optical Unit for Magneto-Optical Pickups
• Spherical Aberration Error Detection for Blu-ray Disc Optical Pickups
• Axially Controlled Solid-Phase Crystallization of Amorphous Silicon
• Structural and Electrical Properties of P- and B-Doped Polycrystalline Silicon by Plasma-Enhanced CVD at 700℃
• Boron Doping to Microeryslalline SiN_H Films
• Incorporation Effects of Nitrogen into Phosphorus Doped Microcrystalline Si:H Films
• A Case of Advanced Breast Cancer Successfully Treated with Primary Endocrine Therapy
• Electron Spin Resonance of Conduction Electrons in Phosphorus Ion-Implanted Silicon
• ESR Studies on P^+ Ion-Implanted Si
• Plasma-Hydrogenation Effects in Doped CVD Amorphous Silicon Films
• Current Transport in Doped Polycrystalline Silicon
• Photoluminescence of Hydrogenated Amorphous Carbon Films
• ESR Studies on Pyrolyzed and Irradiated Polyacrylonitrile
• The Lattice Location of Phosphorus Atoms Implanted into Silicon
• Electron Spin Resonance Studies on Ion-Implanted Silicon. : I. Amorphisation
• Isothermal Annealing in P+ Ion-Implanted Silicon
• Electron Spin Resonance Studies on Ion-Implanted Silicon. : II. Conduction Electrons
• Structural Properties of Ultrathin Amorphous Silicon Oxynitride Layers
• Properties of "Stoichiometric" Silicon Oxynitride Films

もっと見る 閉じる

スポンサーリンク