Effects of the Addition of SiF_4 to the SiH_4 Feed Gas for Depositing Polycrystalline Silicon Films at Low Temperature

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-11-15

著者

• Inokuma T

  Department Of Electronics Faculty Of Technology Kanazawa University

• Inokuma Takao

  Department Of Electronics Kanazawa University

• Inokuma Takao

  Department Of Electronics Faculty Of Technology Kanazawa University

• HASEGAWA Seiichi

  Department of Electronics, Faculty of Technology, Kanazawa University

• KURATA Yoshihiro

  Department of Electronics, Faculty of Technology, Kanazawa University

• SYED Moniruzzaman

  Department of Electronics, Faculty of Technology, Kanazawa University

• Kurata Y

  Precision Technology Development Center Sharp Corporation

• Hasegawa Seiichi

  Department Of Electronics Faculty Of Technology Kanazawa University

• Kurata Yoshihiro

  Department Of Electronics Faculty Of Technology Kanazawa University

• Syed Moniruzzaman

  Department Of Electronics Faculty Of Technology Kanazawa University

• Hasegawa Seiichi

  Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University

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