Inokuma Takao | Department Of Electronics Kanazawa University
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概要
関連著者
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Inokuma Takao
Department Of Electronics Kanazawa University
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Inokuma T
Department Of Electronics Faculty Of Technology Kanazawa University
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Inokuma Takao
Department Of Electronics Faculty Of Technology Kanazawa University
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HASEGAWA Seiichi
Department of Electronics, Faculty of Technology, Kanazawa University
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Kurata Y
Precision Technology Development Center Sharp Corporation
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KURATA Yoshihiro
Department of Electronics, Faculty of Technology, Kanazawa University
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Hasegawa Seiichi
Department Of Electronics Faculty Of Technology Kanazawa University
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Hasegawa Seiichi
Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University
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Kurata Yoshihiro
Department Of Electronics Faculty Of Technology Kanazawa University
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Iiyama K
Graduate School Of Natural Science And Technology Kanazawa University
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Inokuma Takao
Graduate School Of Natural Science And Technology Kanazawa University
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IIYAMA Koichi
Graduate School of Natural Science and Technology, Kanazawa University
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TAKAMIYA Saburo
Graduate School of Natural Science and Technology, Kanazawa University
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Takamiya S
Graduate School Of Natural Science And Technology Kanazawa University
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MIYAMURA Satoshi
Graduate School of Natural Science and Technology, Kanazawa University
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SYED Moniruzzaman
Department of Electronics, Faculty of Technology, Kanazawa University
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Syed Moniruzzaman
Department Of Electronics Faculty Of Technology Kanazawa University
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ONARI Seinosuke
Institute of Applied Physics, The University of Tsukuba
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ARAI Toshihiro
Institute of Applied Physics, The University of Tsukuba
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Arai Takeshi
The Faculty Of Engineering Saitama University
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SETO Hiroki
Graduate School of Natural Science and Technology, Kanazawa University
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ALI Atif
Division of Applied Science, Graduate School of Natural Science and Technology, Kanazawa University
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HE Le-Nian
Department of Electrical & Computer Engineering, Faculty of Engineering, Kanazawa University
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Seto Hiroki
Graduate School Of Natural Science And Technology Kanazawa University
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Ali Atif
Division Of Applied Science Graduate School Of Natural Science And Technology Kanazawa University
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新井 豊子
金大院自然
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Arai Toshihiro
Institute For Optical Research Kyoiku University
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Onari S
Institute Of Applied Physics University Of Tsukuba
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Onari Seinosuke
Institute For Optical Research Tokyo University Of Education
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Arai Toshihiro
Institte For Optical Research Kyoiku University
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YONEZAWA Yasuto
Industrial Research Institute of Ishikawa (IRII)
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El-oyoun Hussein
Department Of Electronics Faculty Of Technology Kanazawa University
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KASAI Yuhki
Research and Development Center, Electronic and Plastic Materials Company, Matsushita Electric Works
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YAMAMURA Youichi
Graduate School of Natural Science and Technology, Kanazawa University
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PAUL Narayan
Graduate School of Natural Science and Technology, Kanazawa University
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NAKAMURA Kazuki
Graduate School of Natural Science and Technology, Kanazawa University
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TAKEBE Masahide
Graduate School of Natural Science and Technology, Kanazawa University
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TAKEMOTO Akira
Graduate School of Natural Science and Technology, Kanazawa University
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HIGASHIMINE Koichi
Japan Advanced Institute of Science and Technology
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OHTSUKA Nobuo
Japan Advanced Institute of Science and Technology
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HE LeNian
Department of Electronics, Faculty of Technology, Kanazawa University
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INOKUMA Takao
Division of Applied Science, Graduate School of Natural Science and Technology, Kanazawa University
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KURATA Yoshihiro
Division of Applied Science, Graduate School of Natural Science and Technology, Kanazawa University
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HASEGAWA Seiichi
Division of Applied Science, Graduate School of Natural Science and Technology, Kanazawa University
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SUGIMOTO Fumitoshi
Fujitsu Laboratories Ltd.
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OKAMURA Sigeru
Fujitsu Laboratories Ltd.
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Ali Atif
Department of Electronics, Faculty of Technology, Kanazawa University
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Inokura Takao
Department of Electronics, Faculty of Technology, Kanazawa University
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SAITO Atsusi
Department of Electrical and Conputer Engineering, Faculty of Technology, Kanazawa University
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LUBGUBAN Jorge
Department of Electrical and Conputer Engineering, Faculty of Technology, Kanazawa University
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UCHIDA Noriyuki
Department of Electronics, Faculty of Technology, Kanazawa University
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TAKENAKA Satoshi
Department of Electronics, Faculty of Technology, Kanazawa University
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TAKESHITA Tetsuyoshi
Department of Elctronics, Faculty of Technology, Kanazawa University
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MAKINO Toshiharu
Institute of Applied Physics, University of Tsukuba
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Takenaka Satoshi
Department Of Electronics Faculty Of Technology Kanazawa University:research And Development Divisio
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He Lenian
Department Of Electronics Faculty Of Technology Kanazawa University
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He L‐n
Zhejiang Univ. Hangzhou Chn
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Saito Atsusi
Department Of Electrical And Conputer Engineering Faculty Of Technology Kanazawa University
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Lubguban Jorge
Department Of Electrical And Conputer Engineering Faculty Of Technology Kanazawa University
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Uchida Noriyuki
Department Of Electronics Faculty Of Technology Kanazawa University
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Takeshita Tetsuyoshi
Department Of Elctronics Faculty Of Technology Kanazawa University
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Makino T
Bell-northern Research Ontario Can
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Sugimoto Fumitoshi
Fujitsu Laboratories Limited, 10-1 Morinosato, Wakamiya, Atsugi, Kanagawa 243-0197, Japan
著作論文
- Mechanical Stress Caused by Adsorption of O or N on Ga-terminated (100) GaAs Surface and InAl-terminated (100) InAlAs Surface : Degradation of Insulator/Semiconductor Interface
- Studies of Effects of Adsorption of Silicon or Germanium on the Electronic States of (100) GaAs Surfaces
- Oxygen and Sulfur Adsorption Effects on Electronic States of GaAs(100) Surfaces Studied with Discrete Variational Xα Method
- Structural and Electrical Characterization of Oxidated, Nitridated and Oxi-nitridated (100) GaAs Surfaces
- Properties of "Stoichiometric" Silicon Oxynitride Films
- Structural Properties of Ultrathin Amorphous Silicon Oxynitride Layers
- Effects of Plasma-Pretreatment on Substrates before Deposition of Polycrystalline Silicon Films(Surfaces, Interfaces, and Films)
- Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition(Optical Properties of Condensed Matter)
- Influence of Organic Contamination on Silicon Dioxide Integrity
- Effects of Addition of SiF_4 During Growth of Nanocrystalline Silicon Films Deposited at 100℃ by Plasma-Enhanced Chemical Vapor Deposition
- Temperature Effects on the Structure of Polycrystalline Silicon Films by Glow-Discharge Decomposition Using SiH_4/SiF_4
- Effects of Nitrogen Addition to Fluorinated Silicon Dioxide Films
- Initial Growth of Polycrystalline Silicon Films on Substrates Subjected to Different Plasma Treatments
- Effects of the Addition of SiF_4 to the SiH_4 Feed Gas for Depositing Polycrystalline Silicon Films at Low Temperature
- Stress in Amorphous SiO_x:H Films Prepared by Plasma-Enhanced Chemical Vapor Deposition
- Properties of "Stoichiometric" Silicon Oxynitride Films
- Effects of Deposition Temperature on Strain in Polycrystalline SiC Films Deposited by Radio-Frequency Glow Discharge
- Pressure Effects on CdS Microcrystals Embedded in Germanate Glasses
- Raman Scattering of Amorphous Semiconductors Ge-S System under High Hydrostatic Pressure