HE Le-Nian | Department of Electrical & Computer Engineering, Faculty of Engineering, Kanazawa University
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概要
- 同名の論文著者
- Department of Electrical & Computer Engineering, Faculty of Engineering, Kanazawa Universityの論文著者
関連著者
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HE Le-Nian
Department of Electrical & Computer Engineering, Faculty of Engineering, Kanazawa University
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Inokuma T
Department Of Electronics Faculty Of Technology Kanazawa University
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Inokuma Takao
Department Of Electronics Kanazawa University
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Inokuma Takao
Department Of Electronics Faculty Of Technology Kanazawa University
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HASEGAWA Seiichi
Department of Electronics, Faculty of Technology, Kanazawa University
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Hasegawa Seiichi
Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University
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KURATA Yoshihiro
Department of Electronics, Faculty of Technology, Kanazawa University
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He L‐n
Zhejiang Univ. Hangzhou Chn
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Kurata Y
Precision Technology Development Center Sharp Corporation
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Hasegawa Seiichi
Department Of Electronics Faculty Of Technology Kanazawa University
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Kurata Yoshihiro
Department Of Electronics Faculty Of Technology Kanazawa University
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He Le-Nian
Department of Electronics, Faculty of Technology, Kanazawa University,
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Hasegawa Seiichi
Department of Electronics, Faculty of Technology, Kanazawa University,
著作論文
- Stress in Amorphous SiO_x:H Films Prepared by Plasma-Enhanced Chemical Vapor Deposition
- Properties of "Stoichiometric" Silicon Oxynitride Films
- Properties of "Stoichiometric" Silicon Oxynitride Films