Stress in Amorphous SiO_x:H Films Prepared by Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-03-15
著者
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Inokuma T
Department Of Electronics Faculty Of Technology Kanazawa University
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Inokuma Takao
Department Of Electronics Kanazawa University
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Inokuma Takao
Department Of Electronics Faculty Of Technology Kanazawa University
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HASEGAWA Seiichi
Department of Electronics, Faculty of Technology, Kanazawa University
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KURATA Yoshihiro
Department of Electronics, Faculty of Technology, Kanazawa University
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HE Le-Nian
Department of Electrical & Computer Engineering, Faculty of Engineering, Kanazawa University
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He L‐n
Zhejiang Univ. Hangzhou Chn
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Kurata Y
Precision Technology Development Center Sharp Corporation
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Hasegawa Seiichi
Department Of Electronics Faculty Of Technology Kanazawa University
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Kurata Yoshihiro
Department Of Electronics Faculty Of Technology Kanazawa University
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Hasegawa Seiichi
Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University
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