Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-04-15

著者

• Horiuchi Tadahiko

  ULSI Device Development Lab., NEC Corporation

• Endo Kazuhiko

  Silicon Systems Research Laboratories Nec Corporation

• Tatsumi T

  Nec Corp. Ibaraki Jpn

• Endo Ken

  Department Of Chemistry Sophia University

• Horiuchi Tadahiko

  Ulsi Device Development Laboratories Ne C Corporation

• Horiuchi Tadahiko

  Ulsi Device Development Lab. Nec Corporation

• TATSUMI Toru

  Silicon Systems Research Laboratories, NEC Corporation

• Endo K

  Department Of Chemistry Sophia University

• MATSUBARA Yoshihisa

  ULSI Device Development Laboratories, NE C Corporation

• Tatsumi Toru

  Silicon Systems Research Laboratories Nec Corporation

• Matsubara Y

  Ulsi Device Development Laboratories Ne C Corporation

• Endo Katsumi

  Department of Chemistry, Sophia University

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