A New Post-Metal Threshold Voltage Adjustment Scheme by Hydrogen Ion Implantation
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Horiuchi Tadahiko
ULSI Device Development Lab., NEC Corporation
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Noguchi Ko
Ulsi Device Development Laboratory Nec Corporation
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Noguchi Ko
Ulsi Device Development Laboratories Nec Corporation
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Horiuchi Tadahiko
Ulsi Device Development Laboratories Nec Corporation
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Horiuchi Tadahiko
Ulsi Device Development Lab. Nec Corporation
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ITO Shinya
ULSI Device Development Laboratories, NEC Corporation
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Ito Shinya
Ulsi Device Development Laboratories Nec Corporation
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- A New Post-Metal Threshold Voltage Adjustment Scheme by Hydrogen Ion Implantation
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