A Precise SOI Film Thickness Measurement Including Gate Depletion and Quantum Effects
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Horiuchi Tadahiko
ULSI Device Development Lab., NEC Corporation
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Onishi Hideaki
Ulsi Device Development Laboratories Nec Corporation
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Kumashiro Shigetaka
Ulsi Device Development Laboratories Nec Corporation
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Horiuchi Tadahiko
Ulsi Device Development Lab. Nec Corporation
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YAMAGUCHI Kensuke
ULSI Device Development Laboratories, NEC Corporation
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IMAI Kiyotaka
ULSI Device Development Laboratories, NEC Corporation
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Imai Kiyotaka
Ulsi Device Development Laboratories Nec Corporation
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Yamaguchi Kensuke
Ulsi Device Development Laboratories Nec Corporation
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IMAI Kiyotaka
ULSI Device Development Division, NEC Corporation
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