IMAI Kiyotaka | ULSI Device Development Division, NEC Corporation
スポンサーリンク
概要
関連著者
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Imai Kiyotaka
Ulsi Device Development Laboratories Nec Corporation
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IMAI Kiyotaka
ULSI Device Development Division, NEC Corporation
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Horiuchi Tadahiko
ULSI Device Development Lab., NEC Corporation
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Onishi Hideaki
Ulsi Device Development Laboratories Nec Corporation
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Kumashiro Shigetaka
Ulsi Device Development Laboratories Nec Corporation
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Horiuchi Tadahiko
Ulsi Device Development Lab. Nec Corporation
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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SHISHIGUCHI Seiichi
Association of Super-advanced Electronics Technologies (ASET)
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YAMAGUCHI Kensuke
ULSI Device Development Laboratories, NEC Corporation
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IMAI Kiyotaka
ULSI Device Development Laboratories, NEC Corporation
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Yamaguchi Kensuke
Ulsi Device Development Laboratories Nec Corporation
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Shibahara Kentaro
Research Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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Imai Kiyotaka
ULSI Device Development Division, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
著作論文
- A Precise SOI Film Thickness Measurement Including Gate Depletion and Quantum Effects
- Phosphorus-Assisted Low-Energy Arsenic Implantation Technology for N-Channel Metal–Oxide–Semiconductor Field-Effect Transistor Source/Drain Formation Process