MATSUBARA Yoshihisa | ULSI Device Development Laboratories, NE C Corporation
スポンサーリンク
概要
関連著者
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MATSUBARA Yoshihisa
ULSI Device Development Laboratories, NE C Corporation
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Matsubara Y
Ulsi Device Development Laboratories Ne C Corporation
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Tatsumi T
Nec Corp. Ibaraki Jpn
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Endo Ken
Department Of Chemistry Sophia University
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Endo K
Department Of Chemistry Sophia University
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Endo Katsumi
Department of Chemistry, Sophia University
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YOSHIDA Hidetsugu
Institute of Laser Engineering, Osaka University
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MATSUDA Tadahito
NTT System Electronics Laboratories
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Horiuchi Tadahiko
ULSI Device Development Lab., NEC Corporation
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Endo Kazuhiko
Silicon Systems Research Laboratories Nec Corporation
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Yoshida Hidemi
Thin Films Laboratory Research Center Mitsubishi Kasei Corporation
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Horiuchi Tadahiko
Ulsi Device Development Laboratories Ne C Corporation
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Horiuchi Tadahiko
Ulsi Device Development Lab. Nec Corporation
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TATSUMI Toru
Silicon Systems Research Laboratories, NEC Corporation
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ENDO Kazuhiko
Microelectronics Research Laboratories, NEC Corporation
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TATSUMI Toru
Microelectronics Research Laboratories, NEC Corporation
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Tatsumi Toru
Silicon Systems Research Laboratories Nec Corporation
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Matsuda T
Ntt Telecommunications Energy Laboratories
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Matsuda Tetsuro
Department Of Electronics Himeji Institute Of Technology
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Matsuda T
Tokyo Inst. Technol. Tokyo Jpn
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Kishino S
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Kishino Seigo
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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Niu Hirohiko
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Himeji I
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Yoshida Haruhiko
Department Of Gastroenterology Faculty Of Medicine University Of Tokyo
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MATSUBARA Yoshihiro
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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KODAI Toshiya
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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Tatsumi Toru
Microelectronics Laboratories Nec Corporation
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Endo Kazuhiko
Microelectronics Research Laboratories Nec Corporation
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Kodai Toshiya
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Niu Hirohiko
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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MATSUBARA Yoshihiro
Department of Data Management and Analyses, Translational Research Information Center
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Yoshida Haruhiko
Department of Electronics, Himeji Institute of Technology, Shosha, Himeji 671-22
著作論文
- Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
- Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition
- MOS-Type One-Dimensional Position-Sensitive Detectors with a Linearly Delectable Face of 30 mm Long