Tatsumi T | Nec Corp. Ibaraki Jpn
スポンサーリンク
概要
関連著者
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Tatsumi T
Nec Corp. Ibaraki Jpn
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TATSUMI Toru
Silicon Systems Research Laboratories, NEC Corporation
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Tatsumi Toru
Silicon Systems Research Laboratories Nec Corporation
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Kobayashi Sota
Silicon Systems Research Laboratories Nec Corporation
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Kobayashi S
Science University Of Tokyo In Yamaguchi
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Kobayashi S
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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Endo Ken
Department Of Chemistry Sophia University
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Koike H
Nec Corp. Kanagawa Jpn
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Toyoshima Hideo
Silicon Systems Research Laboratories Nec Corporation
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Yamada Jun-ichi
Graduate School Of Engineering Osaka University
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Kobayashi Shunsuke
Science University Of Tokyo
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Kobayashi Shunsuke
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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Yamada Junichi
Silicon Systems Research Laboratories Nec Corporation
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Kobayashi Shunsuke
Liquid Crystal Institute Science University Of Tokyo In Yamaguchi
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Yamada J
Aichi Institute Of Technology
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Endo K
Department Of Chemistry Sophia University
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MATSUBARA Yoshihisa
ULSI Device Development Laboratories, NE C Corporation
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TATSUMI Toru
Microelectronics Research Laboratories, NEC Corporation
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Koike H
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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Hada H
System Devices Research Laboratories Nec Corporation
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Hada Hiromitsu
Nec Corporation Device Platforms Research Laboratories
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Hada Hiromitsu
Silicon Systems Research Laboratories Nec Corporation
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AMANUMA Kazushi
Silicon Systems Research Laboratories, NEC Corporation
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MAEJIMA Yukihiko
Silicon Systems Research Laboratories, NEC Corporation
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MIWA Tohru
Silicon Systems Research Laboratories, NEC Corporation
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KOIKE Hiroki
Silicon Systems Research Laboratories, NEC Corporation
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KUNIO Takemitsu
Silicon Systems Research Laboratories, NEC Corporation
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Miwa Tohru
Silicon Systems Research Laboratories Nec Corporation
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Amanuma K
Silicon Systems Research Laboratories Nec Corporation
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Amanuma Kazushi
Silicon Systems Research Laboratories Nec Corporation
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Kunio T
Silicon Systems Research Laboratories Nec Corporation
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Maejima Y
Silicon Systems Research Laboratories Nec Corporation
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Maejima Yukihiko
Silicon Systems Research Laboratories Nec Corporation
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Tatsumi Toru
Microelectronics Laboratories Nec Corporation
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Matsubara Y
Ulsi Device Development Laboratories Ne C Corporation
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Endo Katsumi
Department of Chemistry, Sophia University
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Horiuchi Tadahiko
ULSI Device Development Lab., NEC Corporation
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Endo Kazuhiko
Silicon Systems Research Laboratories Nec Corporation
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Kobayashi Shunsuke
Department Of Electronic Engineering (div. Of Engineering Sciences) Faculty Of Technology Tokyo Univ
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Horiuchi Tadahiko
Ulsi Device Development Laboratories Ne C Corporation
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Horiuchi Tadahiko
Ulsi Device Development Lab. Nec Corporation
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ENDO Kazuhiko
Microelectronics Research Laboratories, NEC Corporation
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Hiroi M
Nec Corp. Ibaraki
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Hiroi Masayuki
Microelectronics Research Laboratories Nec Corporation
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Sakai Junro
Anelva Corporation
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Sakai Junro
Anelva Cotp.
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AKETAGAWA Ken-ichi
ANELVA Cotp.
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NIINO Taeko
Microelectronics Laboratories, NEC Corp.
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Kobayashi Shun-ichi
Department Of Physics School Of Science University Of Tokyo
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Niino T
Microelectronics Laboratories Nec Corp.
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Endo Kazuhiko
Microelectronics Research Laboratories Nec Corporation
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Kobayashi Shunichi
Department Of Physics Graduate School Of Science The University Of Tokyo
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KOBAYASHI Shun-ichi
Faculty of Engineering Science, Osaka University:(Present address)Department of Physics, University of Tokyo
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HIROI Masayuki
Microelectronics Laboratories, NEC Corp.
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Kobayashi Shunichi
Department of Physics, Faculty of Science, University of Tokyo
著作論文
- Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
- Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition
- Characteristics of 0.25 μm Ferroelectric Nonvolatile Memory with a Pb(Zr, Ti)O_3 Capacitor on a Metal/Via-Stacked Plug
- 0.25μm FeRAM with CMVP (Capacitor-on-Metal/Via-Stacked-Plug) Memory Cell
- Selective Epitaxial Growth of Si and Si_Ge_x Films by Ultrahigh-Vacuum Chemical Vapor Deposition Using Si_2H_6 and GeH_4