Tatsumi Toru | Silicon Systems Research Laboratories Nec Corporation

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Mechanism of Leakage Current Reduction by Adding WO_3 to Crystallized Ta_2O_5 : Structure and Mechanical and Thermal Properties of Condensed Matter
Suppression of Charges in Al_2O_3 Gate Dielectric and Improvement of MOSFET Performance by Plasma Nitridation(High-κ Gate Dielectrics)
Suppression of Charges in Al_2O_3 Gate Dielectric and Improvement of MOSFET Performance by Plasma Nitridation
Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
Characteristics of 0.25 μm Ferroelectric Nonvolatile Memory with a Pb(Zr, Ti)O_3 Capacitor on a Metal/Via-Stacked Plug
0.25μm FeRAM with CMVP (Capacitor-on-Metal/Via-Stacked-Plug) Memory Cell
Ultrathin Oxide Film Formation Using Radical Oxygen in an Ultrahigh Vacuum System
Uniform Raised-Salicide Technology for High-Performance CMOS Devices(Special Issue on Advanced Sub-0.1μm CMOS Devices)
Metal Organic Atomic Layer Deposition of High-$k$ Gate Dielectrics Using Plasma Oxidation
Controlling Fluorine Concentration of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

スポンサーリンク