Mechanism of Leakage Current Reduction by Adding WO_3 to Crystallized Ta_2O_5 : Structure and Mechanical and Thermal Properties of Condensed Matter

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概要

• 論文の詳細を見る
• 2001-06-15

著者

• KOBAYASHI Kenji

  Fundamental Research Laboratories, NEC Corporation

• MANABE Kenzo

  Silicon Systems Research Laboratories, NEC Corporation

• TATSUMI Toru

  Silicon Systems Research Laboratories, NEC Corporation

• Tatsumi Toru

  Silicon Systems Research Laboratories Nec Corporation

• Fujieda Shinji

  Silicon Systems Research Laboratories System Devices And Fundamental Research Nec Corporation

• Fujieda Shinji

  Silicon Systems Research Laboratories Nec Corporation

• Manabe Kenzo

  Silicon Systems Research Laboratories Nec Corporation

• Kobayashi Kenji

  Fundamental Research Laboratories Nec Corporation

• Koba Kenji

  Fundamental Research Laboratories, NEC Corporation

関連論文

• Mechanism of Leakage Current Reduction by Adding WO_3 to Crystallized Ta_2O_5 : Structure and Mechanical and Thermal Properties of Condensed Matter
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