Ikarashi Nobuyuki | Silicon Systems Research Laboratories Nec Corporation
スポンサーリンク
概要
関連著者
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Ikarashi Nobuyuki
Silicon Systems Research Laboratories Nec Corporation
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IWAMOTO Toshiyuki
Silicon Systems Research Labs., NEC Corporation
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IKARASHI Nobuyuki
Silicon Systems Research Labs., NEC Corporation
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Yamamoto Toyoji
Silicon Systems Research Laboratories Nec Corporation
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Endo Kazuhiko
Division Of Biomaterials And Bioengineering Department Of Oral Rehabilitation School Of Dentistry He
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Endo Kazuhiko
Silicon Systems Research Laboratories Nec Corporation
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Kamiyama S
Faculty Of Science And Technology Meijo University
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Kamiyama S
Silicon Systems Research Laboratories Nec Corporation
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Kamiyama Satoshi
Ulsi Device Development Laboratories Nec Corporation
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Ogura Takashi
Silicon Systems Research Laboratories Nec Corporation
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Ogura Takeshi
Ntt Cyber Space Laboratories
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TATSUMI Toru
System Devices Research Laboratories, NEC Corporation
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Yamamoto Tetsushi
Material And Life Science Graduate School Of Engineering Osaka University
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Endo Kazuhiko
Department Of Dental Materials Science School Of Dentistry Health Science University Of Hokkaido
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YAMAMOTO Toyoji
Silicon Systems Research Labs., NEC Corporation
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MANABE Kenzo
Silicon Systems Research Laboratories, NEC Corporation
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KAMIYAMA Satoshi
Silicon Systems Research Laboratories, NEC Corporation
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TATSUMI Toru
Silicon Systems Research Laboratories, NEC Corporation
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Tatsumi Toru
System Devices Research Laboratories Nec Corporation
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Tatsumi Toru
Silicon Systems Research Laboratories Nec Corporation
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Ogura T
Ntt Network Innovation Laboratories
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Kamiyama Satoshi
Silicon Systems Research Laboratories Nec Corporation
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Manabe Katsuya
System Devices Research Laboratories Nec Corporation
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Manabe Kenzo
Silicon Systems Research Laboratories Nec Corporation
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Iwamoto T
Keio Univ. Fujisawa‐shi Jpn
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Yamamoto T
Toray Research Center Inc.
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IKARASHI Nobuyuki
NEC Corporation, Device Platforms Research Laboratories
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Ikarashi N
Nec Corporation Device Platforms Research Laboratories
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Ikarashi Nobuyuki
System Devices Research Laboratories Nec Corporation
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Kamiyama Satoshi
Faculty of Science and Technology, Meijo University
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Kamiyama Satoshi
Faculty of Science and Technology, the 21st Century COE Program "Nano-Factory", Meijo University
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Usuda Koji
Lsi Basic Technology Laboratory Toshiba Co.
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NAKAMURA Hidetatsu
Silicon Systems Research Labs., NEC Corporation
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Hane Masami
Silicon Systems Research Laboratories Nec Corporation
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Ezaki Tatsuya
Silicon Systems Research Laboratories Nec Corporation
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Watanabe Koji
Silicon Systems Research Laboratories, NEC Corporation
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Ikezawa Takeo
Platform Software Division Nec Infomatec Systems Ltd.
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Togo Mitsuhiro
Silicon Systems Research Labs. Nec Corporation
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Yamasaki Jun
Department Of Chemistry Faculty Of Science Kochi University
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Yamasaki Jun
Department Of Crystalline Materials Science And C. I. R. S. E. Of Nagoya University
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Tanaka Nobuo
Department Of Agro-environmental Sciences Graduate School Of Bioresource And Bioenvironmental Scienc
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Ikarashi Nobuyuki
Silicon Systems Research Laboratory Nec Co.
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Watanabe Koji
Silicon Systems Research Laboratories Nec Corporation
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Tanaka Nobuo
Department Of Crystalline Materials Science And C. I. R. S. E. Of Nagoya University
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Hane Masami
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Yamamoto Toyoji
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ikarashi Nobuyuki
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Togo Mitsuhiro
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ezaki Tatsuya
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ikezawa Takeo
Platform Software Division, NEC Infomatec Systems, Ltd., 3-2-1 Sakado, Takatsu-ku, Kawasaki, Kanagawa 213-0012, Japan
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Iwamoto Toshiyuki
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Nakamura Hidetatsu
Silicon Systems Research Labs., NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
著作論文
- Suppression of Charges in Al_2O_3 Gate Dielectric and Improvement of MOSFET Performance by Plasma Nitridation(High-κ Gate Dielectrics)
- Suppression of Charges in Al_2O_3 Gate Dielectric and Improvement of MOSFET Performance by Plasma Nitridation
- First observation of SiO_2/Si(100) interfaces by spherical aberration-corrected high-resolution transmission electron microscopy
- Quantitative Characterization of Roughness at SiO_2/Si Interfaces by Using Cross-sectional High-resolution Transmission Electron Microscopy
- Effects of Selecting Channel Direction in Improving Performance of Sub-100 nm MOSFETs Fabricated on (110) Surface Si Substrate