Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-10-15
著者
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Tatsumi T
Nec Corp. Ibaraki Jpn
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Endo Ken
Department Of Chemistry Sophia University
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Endo K
Department Of Chemistry Sophia University
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MATSUBARA Yoshihisa
ULSI Device Development Laboratories, NE C Corporation
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ENDO Kazuhiko
Microelectronics Research Laboratories, NEC Corporation
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TATSUMI Toru
Microelectronics Research Laboratories, NEC Corporation
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Tatsumi Toru
Microelectronics Laboratories Nec Corporation
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Endo Kazuhiko
Microelectronics Research Laboratories Nec Corporation
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Matsubara Y
Ulsi Device Development Laboratories Ne C Corporation
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Endo Katsumi
Department of Chemistry, Sophia University
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