Invited Nitride Semiconductor Nanostructures and Their Optical Properties (先端デバイスの基礎と応用に関するアジアワークショップ)
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概要
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Nanostructures of InN and InGaN were grown by MOCVD and their optical properties were investigated. With the introduction of high growth temperature, InN/GaN quantum well structure was successfully grown for the first time. Their structural properties could be controlled by growth interruption. InGaN quantum well and quantum dot structures were also grown by controlling growth temperature and In incorporation. From PL analysis, InGaN quantum dot structure showed enhanced thermal characteristics, compared with that of quantum well structure. In the case of InN/GaN quantum well structure, enhanced thermal characteristics appeared when grown without growth interruption. It is supposed that InN/GaN quantum well structure has intrinsic quantum-dot like features caused by thickness fluctuation.
- 社団法人電子情報通信学会の論文
- 2003-06-25
著者
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KIM Hyun
School of Mechanical Engineering, Pusan National University
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YOON Euijoon
School of Materials Science and Engineering, Seoul National University
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Yoon Eujioon
School Of Materials Science And Engineering Seoul National University
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NA Hyunseok
School of Materials Science and Engineering, Seoul National University
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KWON Soon-Yong
School of Materials Science and Engineering, Seoul National University
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Na Hyunseok
School Of Materials Science And Engineering Seoul National University
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Kwon Soon-yong
School Of Materials Science And Engineering Seoul National University
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Kim Hyun
School Of Materials Science And Engineering Seoul National University
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Kim Hyun
School Of Civil Environmental And Architectural Engineering Korea University
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Yoon Euijoon
School Of Electronic And Electrical Engineering Kyungpook National University
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Kim Hyun
School of Advanced Materials Science and Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Republic of Korea
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