シリコン添加水素化アモルファスカーボン薄膜の機械的性質に及ぼす膜構成元素の影響

概要

論文の詳細を見る
This paper studies elementary and structural effects on mechanical properties of silicon incorporated amorphous hydrogenous carbon films. Fifteen kinds of the carbon films were prepared by plasma-enhanced chemical vapor deposition method of the penning ionization gauge discharge type using argon, acethylen and tetramethylsilane gases. X-ray photoelectron and Raman spectroscopes performed elementary and microstructural analyses of the carbon films, respectively. Nano-indentation tests were also carried out in order to characterize the reduced elastic modulus and hardness of the carbon films. Intermixture of the tetramethylsilane gas led to a formation of silicon-carbon bonding and an increase of hydrogen atoms in the films. Hydrogen atoms also increased with a reduction of the negative bias voltage at the film substrate. The reduced modulus and hardness of the carbon films ranged from 53 GPa to 163 GPa and from 9 GPa to 29 GPa, respectively. Better mechanical properties resulted from a reduction of tetramethylsilane gases and an increase of the negative bias voltage. The bias voltage especially had a larger influence on the mechanical properties than the gas flow rate. Molecular orbital calculations revealed that the role of a double bond of carbon atoms was likely significant for better mechanical properties of the carbon films.
一般社団法人日本機械学会の論文
2003-03-25