スパッタ成膜した窒化物薄膜のHeイオン収量XAFS法による局所構造解析(<特集>セラミック材料)

概要

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He ion yield XAFS measurements under He atmosphere at ambient pressure have been adopted for analyzing the local structure of several metal nitride thin films. XANFS spectra and EXAFS parameters for zinc blend-type iron nitride, obtained by the yield XAFS, have coincided with those obtained using the conventional transmission XAFS. The yield XAFS measurements employing the grazing incidence technique have been presented for the determination of chemical species on the surface of Ti-Al-N films after the erosion experiment, showing the followings; the corrosion products on the film surface after heating at 600℃ under O_2 gas flow were Ti based oxides, either TiO_2 or Al_2TiO_5. Al_2TiO_5 was slightly yielded not only on Al-rich Ti_<1-x>Al_xN but also on Ti-rich Ti_<1-x>Al_xN films after aging in a distilled water for 2 weeks. The local structure around Fe for Si-Fe-N films before and after annealing in an H_2 atmosphere at several temperatures has been investigated. The as-deposited Si-Fe-N film contained Fe with local structure similar to that of FeN_y(y=0.5) and such local structure was not broken against the annealing at 300℃. Annealing at 500℃ changed the local structure around Fe, i.e., N bonded to Fe was almost eliminated and Fe formed a fine particle similar to α-Fe.
社団法人日本材料学会の論文
1998-06-15