Observation of Dipole-Forbidden Transitions througy Fano Antiresonance in Boron-Doped Silicon
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概要
- 論文の詳細を見る
Infrared absorption in boron-doped silicon has been investigated in the photonenergy range from 450to 1000 cm '. Below the continuous background absorptionby hole transition, a series of profound dips are observed for dipole-forbidden transi-lions of phonon and electronic states. These transitions become permitted throughconfiguration interaction with the electronic continuum of the hole state, leading to asharp antiresonance structure in the spectrum. This interpretation is confirmed by ourmeasurement of spectral dependences on acceptor concentration, donor compensa-tion and sample temperature.[Fano-resonance, electron-phonon interaction, boron in silicon, local lattice ][ vibration, optical phonon, acceptor level%
- 社団法人日本物理学会の論文
- 1988-11-15
著者
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Nishina Yuichiro
Institute for Materials Research, Tohoku University
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Kasuya Atsuo
Institute Of Materials Resesrch Tohoku University
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Kasuya Atsuo
Institute For Materials Research Tohoku University
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SUEZAWA Masashi
Institute for Materials Research,Tohoku University
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SUMINO Koju
Institute for Materials Research,Tohoku University
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Suezawa Masashi
Institute For Materials Research Tohoku University
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Nishina Yuichiro
Institute For Materials Research (imr) Tohoku University
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Nishina Yuichiro
Institute For Materials Research Tohoku University
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Sumino Koju
Institute For Materials Research Tohoku University
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Kasuya Atsuo
Institute For Iron Steel And Other Metals Tohoku University
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