Field Ion-Scanning Tunneling Microscopy Study of C_<84> on the Si(100) Surface
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-15
著者
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Nishina Yuichiro
Institute for Materials Research, Tohoku University
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Wang Xiangdong
Institute For Materials Research (imr) Tohoku University
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HASHIZUME Tomihiro
Institute for Materials Research (IMR), Tohoku University
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SHINOHARA Hisanori
Chemistry Department, Nagoya University
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SAKURAI Toshio
Institute for Materials Research (IMR), Tohoku University
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WANG Xiang-Dong
Institute for Materials Research (IMR), Tohoku University
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SHINOHARA Hisanori
Institute for Materials Research (IMR), Tohoku University
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SAITO Yahachi
Institute for Materials Research (IMR), Tohoku University
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Wang Xiangdong
神戸大学医学部附属医学研究国際交流センター院生
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Wang Xiang-dong
Institute For Materials Research (imr) Tohoku University
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Saito Yahachi
Institute For Materials Research (imr) Tohoku University
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Sakurai Toshio
Institute For Materials Research (imr) Tohoku University
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Nishina Yuichiro
Institute For Materials Research (imr) Tohoku University
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Shinohara H
Department Of Chemistry Nagoya University
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Shinohara Hisanori
Chemistry Department Nagoya University
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Shinohara H
Nagoya Univ. Nagoya Jpn
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Wang X
Tokyo Inst. Technol. Yokohama Jpn
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Hashizume Tomihiro
Institute For Materials Research (imr) Tohoku University
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Shionohara Hisanori
Department Of Chemistry For Materials Faculty Of Engineering Mie Univetsity
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HASHIZUME Tomihiro
Institute for Materials Research (IMR), Tohoku University:(Present address)Advanced Research Laboratory, Hitachi Ltd.
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SHINOHARA Hisanori
Institute for Clinical Research, Zentsuji National Hospital
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