プラズマベースイオン注入法を用いた窒素イオン注入表面の高分解能ラザフォード後方散乱分光法による評価

概要

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Plasma-based ion implantation (PBII) with negative voltage pulses to the test specimen has been applied to the sterilization process as a technique suitable for three-dimensional work pieces. Pulsed high negative voltage (5 μs pulse width, 300 pulses/s, -800 V to -15 kV) was applied to the electrode in this process at a gas pressure of 2.4 Pa of N2. We found that the PBII process, in which (N2 gas self-ignitted plasma generated by only pulsed voltages is used) reduces the numbers of active Bacillus pumilus cell. The number of bacteria survivors was reduced by 10-5 x with 5 min exposure. As the ion energy is one of the important processing parameters on sterilization of the surface, the ion energy is discussed from the high resolution RBS depth profile.
日本真空協会の論文
2006-05-20