Precise Thermal Characterization of Confined Nanocrystalline Silicon by a 3ω Method

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-06-15

著者

• Kihara T

  Department Of Anatomy Osaka Medical College

• Kihara T

  Research & Development Headquarters Yamatake Corporation

• KIHARA Takashi

  Research & Development Headquarters, Yamatake Corporation

• HARADA Toshihiro

  Research & Development Headquarters, Yamatake Corporation

• KOSHIDA Nobuyoshi

  Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric

• Koshida N

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

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