Precise Thermal Characterization of Confined Nanocrystalline Silicon by a 3ω Method
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-06-15
著者
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Kihara T
Department Of Anatomy Osaka Medical College
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Kihara T
Research & Development Headquarters Yamatake Corporation
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KIHARA Takashi
Research & Development Headquarters, Yamatake Corporation
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HARADA Toshihiro
Research & Development Headquarters, Yamatake Corporation
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KOSHIDA Nobuyoshi
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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Koshida N
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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