高分子液晶を用いた片側パターン電極による選択的研磨制御 : 第1報, ERスラリーのER効果と研磨特性(機械要素,潤滑,工作,生産管理など)

概要

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Demands for accuracy and downsizing of industrial products have been escalating recently. And it is difficult to meet such demands only with conventional technologies. Therefore, the process technologies with fields, e.g. an electric field or a magnetic field, are remarked. "ER slurry" that we named is a composition of ER fluid and abrasive grains. Using this slurry under the electric field, we can control polishing conditions. In this report, we propose one-sided pattern electrodes that are arranged on one-side. And we also propose to use them for ER polishing which is the polishing with the ER slurry. At first, ER effects of the ER slurry which was composed of a liquid crystalline polymer (LCP) and diamond grains were investigated. These characteristics depend on a pattern type of electrodes and density of the grains. In addition, we tried the polishing with the ER slurry and confirmed that the electric field accelerated the polishing.
社団法人日本機械学会の論文
2005-08-25