Simulation of Boron Diffusion in High-Dose BF_2 Implanted Silicon

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-04-15

著者

• Uematsu M

  Ntt Basic Research Laboratories Ntt Corporation

• Uematsu Masashi

  Ntt Basic Research Laboratories

• Uematsu Masaya

  NTT Basic Research Laboratories, NTT Corporation

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