Mobility Enhancement in Highly Strained δ-Doped InP/InGaAs/InP Heterostructure with InGaP Cap Layer Grown by Low-Pressure Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-15
著者
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HSU Wei-Chou
Department of Electrical Engineering, National Cheng-Kung University
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Hsu W‐c
National Cheng‐kung Univ. Tainan Twn
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Liu W‐c
National Cheng‐kung Univ. Tainan Twn
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Liu Wen-chau
Institute Of Microelectronics Department Of Electrical Engineering National Cheng-kung University
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Hsu Wei-chou
Department Of Electrical Engineering National Cheng Kung University
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Hsu Rong-tay
Department Of Electrical Engineering National Cheng Kung University
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SU Jan-Shing
Department of Electrical Engineering, National Cheng Kung University
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LIN Wei
Photonic Technology Research, Telecommunication Lab., Ministry of Transportation and Communication
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Hsu Wei-cheng
Materials Research Laboratory
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Su Jan-shing
Department Of Electrical Engineering National Cheng Kung University
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Lin Wei
Photonic Technology Research Telecommunication Laboratories Chunghwa Telecom Co. Ltd.
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Liu Wen-Chau
Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University
関連論文
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- Mobility Enhancement in Highly Strained δ-Doped InP/InGaAs/InP Heterostructure with InGaP Cap Layer Grown by Low-Pressure Metalorganic Chemical Vapor Deposition
- Temperature-Dependent Characteristics of an Sulfur-Passivated AlGaAs/InGaAs/GaAs Pseudomorphic High Electron Mobility Transistor (PHEMT)
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