Improved Selectively δ-Doped GaAs/InGaAs Double-Quantum-Well Pseudomorphic HFET's Utilizing a Buried P-Layer on the Buffer
スポンサーリンク
概要
- 論文の詳細を見る
This letter demonstrates a new double-quantum-well (DQW) selectively δ-doped GaAs/InGaAs HFET'S utilizing a buried lightly doped p-layer on the GaAs buffer prepared by low-pressure metalorganic chemical vapor deposition (MOCVD). Pinch-off characteristic and transconductance the remarkably improved in the DQW HFET's by using a buried p-layer. The extrinsic transconductances of the DQW HFET's with and without the buried p-layer are 240 mS/mm and 190 mS/mm, respectively.
- 社団法人応用物理学会の論文
- 1993-10-15
著者
-
HSU Wei-Chou
Department of Electrical Engineering, National Cheng-Kung University
-
Hsu Wei-chou
Department Of Electrical Engineering National Cheng Kung University
-
KAO Ming-Jer
Department of Electrical Engineering, National Cheng Kung University
-
Kao Ming-jer
Department Of Electrical Engineering National Cheng Kung University
-
SHIEH Hir-Ming
Department of Electronic Engineering, Kung-Shan Institute of Technology
-
Shieh Hir-ming
Department Of Electrical Engineering National Cheng Kung University
-
Hsu Wei-Chou
Department of Electrical Engineering, National Cheng Kung University
関連論文
- Regenerative Switching Phenomenon of a GaAs Metal-n-δ(p^+)-n-n^+ Structure
- Emitter Edge-Thinning Effect on InGaAs/InP Double-Heterostructure-Emitter Bipolar Transistor
- Mobility Enhancement in Highly Strained δ-Doped InP/InGaAs/InP Heterostructure with InGaP Cap Layer Grown by Low-Pressure Metalorganic Chemical Vapor Deposition
- High-Temperature Breakdown Characteristics of δ-Doped In_Ga_P/GaAs/In_Ga_As/AlGaAs High Electron Mobility Transistor
- An Improved In_Ga_P/GaAs Double Heterostructure-Emitter Bipolar Transistor Using Emitter Edge-Thinning Technique
- A Study of Layer Thickness and Interface Qualities of Strained ln_xGa_As/GaAs Layers
- Enhanced Two-Dimensional Electron Gas Concentrations and Mobilities in Multiple δ-Doped GaAs/In_Ga_As/GaAs Pseudomorphic Heterostructures
- A Four-Terminal GaAs Multiple-Function Transistor with a Buried Silicon-Doping Quantum Well
- Improved Selectively δ-Doped GaAs/InGaAs Double-Quantum-Well Pseudomorphic HFET's Utilizing a Buried P-Layer on the Buffer