Patterning of Epitaxial Organic Films by Selective Epitaxial Growth
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概要
- 論文の詳細を見る
A new method of patterning crystalline organic molecular films is proposed and demonstrated. It utilizes a selective growth, or the difference in the sticking coefficient of an organic material on various inorganic substrates in a certain temperature range. The object structure is first patterned on a single-crystalline substrate with an epitaxial film of a different material grown by molecular beam epitaxy (MBE) through a mask, and then a beam of the organic molecule is irradiated uniformly after removing the mask.
- 社団法人応用物理学会の論文
- 1996-02-15
著者
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SUZUKI AKIRA
Department of Hospital Pharmacy
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Shimada Toshihiro
Department Of Chemistry School Of Science The University Of Tokyo
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Koma Atsushi
Department Of Applied Physics University Of Tokyo
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Suzuki Akira
Department Of Biology Faculty Of Education Chiba University
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Suzuki Akira
Department Of Anesthesiology And Intensive Care Hamamatsu University School Of Medicine
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Suzuki Akira
Department Of Chemistry University Of Tokyo
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